RF magnetron sputtering SnO2: Sb films deposited on organic substrates

Ma, Jin; Hao, Xiaotao; Ma, Hongjuan; Xu, Xin; Yang, Ying; Huang, Shulai; Zhang, Deheng; Cheng, Chuanfu

doi:10.1016/s0038-1098(02)00009-1

Cited by 21 publications

(11 citation statements)

References 11 publications

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“…It is important to note that the tin dioxide thin films of this work have the lowest value for the resistivity, even with the smallest thin-films' thickness. Utsumi et al [36] and Ma et al [37] use lower annealing temperatures, however combining annealing with [37] deposition, which significantly complicated the control of the deposition. The SEM images presented in figure 4 are for a selected sample of a tin dioxide thin film deposited under the optimal settings.…”

Section: Layer Materials Of the Solid-state Batterymentioning

confidence: 99%

Thermoelectric generator and solid-state battery for stand-alone microsystems

Carmo

Ribeiro

Silva

et al. 2010

J. Micromech. Microeng.

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This paper presents a thermoelectric (TE) generator and a solid-state battery for powering microsystems. Prototypes of TE generators were fabricated and characterized. The TE generator is a planar microstructure based on thin films of n-type bismuth telluride (Bi 2 Te 3) and p-type antimony telluride (Sb 2 Te 3), which were deposited using co-evaporation. The measurements on selected samples of Bi 2 Te 3 and Sb 2 Te 3 thin films indicated a Seebeck coefficient in the range of 90-250 µV K −1 and an in-plane electrical resistivity in the range of 7-17 µ m. The measurements also showed TE figures-of-merit, ZT, at room temperatures (T = 300 K) of 0.97 and 0.56, for thin films of Bi 2 Te 3 and Sb 2 Te 3 , respectively (equivalent to a power factor, PF, of 4.87 mW K −2 m −1 and 2.81 mW K −2 m −1). The solid-state battery is based on thin films of: an anode of tin dioxide (SnO 2), an electrolyte of lithium phosphorus oxynitride (Li x PO y N z , known as LiPON) and a cathode of lithium cobaltate (LiCoO 2 , known as LiCO), which were deposited using the reactive RF (radio-frequency) sputtering. The deposition and characterization results of these thin-films layers are also reported in this paper.

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Section: Layer Materials Of the Solid-state Batterymentioning

confidence: 99%

Thermoelectric generator and solid-state battery for stand-alone microsystems

Carmo

Ribeiro

Silva

et al. 2010

J. Micromech. Microeng.

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“…In earlier works, tin oxide thin films were prepared by variety of methods such as chemical vapor deposition (CVD) (Kim et al, 2001), sputtering (Ma et al, 2002), solgel spin coating (Dua et al, 2008), spray pyrolysis (Jain and Kumar, 2004;Kasar et al, 2008), hydrothermal method (Zhang and Gao, 2004), pulsed laser deposition (Kim and Pique, 2004), and electrochemical deposition (Lai et al, 2009). One of these methods, electrodeposition is a desirable technique (Yang et al, 2010) due to its properties such as low-cost, simplicity and effectiveness in preparing large area thin films (Vequizo et al, 2010) and fast production (Yeh et al, 2012).…”

Section: Introductionmentioning

confidence: 99%

Investigation of structural, morphological and optical properties of electrodeposited SnO2 thin films

Aydın¹

2012

Int. J. Phys. Sci.

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In this study, we investigated the deposition time effects on structural, morphological and optical properties of electrodeposited SnO 2 thin films. Tin oxide thin films were deposited at 10, 15 and 20 min deposition times and characterized using X-ray diffraction (XRD), scanning electron microscope (SEM) and energy dispersive X-ray spectrometer (EDX) and UV-VIS spectrometer. XRD results showed that SnO 2 thin films were polycrystalline with tetragonal crystal structure and increasing the deposition time improved the crystallinity of SnO 2. From SEM images, there were particles on the surface of SnO 2 and particle size depended on deposition time. EDX analysis confirmed that the amount of Sn and O elements increased with increasing deposition time. From the optical studies, it was found that the transmittance values in visible region varied between 69.53 and 86.27%. These findings showed that SnO 2 films can be electrodeposited without oxygen rich environment at room temperature. Also, the films obtained can be used in many devices such as solar cells and gas sensors.

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“…A further advantage of sputtering compared to other techniques is the possibility of growing films at low deposition temperatures [6]. Thus, the deposition of tin oxide on organic substrates such as polyimide (PI) [7,8] and even on flexible organic substrates such as polypropylene adipate (PPA) [9] is possible. Commonly, reactive radio-frequency sputtering (rfMS) is utilised for the sputter deposition of tin oxide and is extensively studied in the literature [7][8][9][10][11][12][13].…”

Section: Introductionmentioning

confidence: 99%