Rf sputtering of composite SiO /plasma polymer films and their basic properties

Surface wettability of plasma SiO x :H nanocoating-induced endothelial cells' migration and the associated FAK-Rho GTPases signalling pathways

“…According to the results of electronic supplementary material, figure S3, 50 nmol ml 21 of FAK inhibitor were chosen to check if it could inhibit cell migration on plasma SiO x :H coating (figure 8). The cell migration on different surfaces with different wettabilities decreased at 12 h, which was compared with previous results in figure 6 (without the addition of FAK inhibitor). In addition, there is no significant differences among all hydrophilic and hydrophobic groups.…”

“…Non-stoichiometric silicon oxides (SiO x with 0 , x 2) have been widely applied as optical coatings, passivation layers and interlayers in electronics owing to their low dielectric constant (low-k) [6,7]. SiO x :H coatings prepared by low-temperature plasma deposition may have wellcontrolled surface wettability via mediating plasma gas compositions, e.g.…”

Deposition of Cu/a-C:H Nanocomposite Films

“…[7][8][9][10] Nanocomposites with hydrocarbon matrix are commonly prepared by magnetron sputtering of metals in hydrocarboncontaining gases [11][12][13][14][15] or by simultaneous magnetron sputtering of two (or more) solid materials. [11][12][13][14][15][16][17][18][19][20][21] For review see. [22] These approaches are known for their limited ability to control independently the amount of NPs, their size distribution and the properties of embedding matrix.…”

Deposition of superhydrophobic nanostructured Teflon-like coating using expanding plasma arc

“…Teflon is a fluorocarbon compound and Teflon-like coatings are deposited by different methods. These methods include polymerization of fluorocarbon precursors in radio frequency plasma [11], ion beam sputtering [12], and rf sputtering [13,14].…”