2022
DOI: 10.1109/ted.2022.3188231
|View full text |Cite
|
Sign up to set email alerts
|

Rigorous Modeling and Investigation of Low-Field Hole Mobility in Silicon and Germanium Gate-All-Around Nanosheet Transistors

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2024
2024
2025
2025

Publication Types

Select...
3
1

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(1 citation statement)
references
References 35 publications
0
1
0
Order By: Relevance
“…Mincheol Shin et al developed a highly efficient computational simulator by reducing the Hamiltonian size through transformation to the mode-space basis [18][19][20][21]. Full quantum transport simulations of largescale NWFETs based on the k • p mode-space method often effectively reduce computational costs [20,22,23]. As the device is miniaturized and the material approaches the nanoscale, many parameters of the bulk material fail due to significant quantum effects, surface effects, lattice distortions, defects, etc.…”
Section: Introductionmentioning
confidence: 99%
“…Mincheol Shin et al developed a highly efficient computational simulator by reducing the Hamiltonian size through transformation to the mode-space basis [18][19][20][21]. Full quantum transport simulations of largescale NWFETs based on the k • p mode-space method often effectively reduce computational costs [20,22,23]. As the device is miniaturized and the material approaches the nanoscale, many parameters of the bulk material fail due to significant quantum effects, surface effects, lattice distortions, defects, etc.…”
Section: Introductionmentioning
confidence: 99%