Adhesion in Microelectronics 2014
DOI: 10.1002/9781118831373.ch6
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Role of Adhesion Phenomenon in the Reliability of Electronic Packaging

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“…For the current study, IDCs were cleaned with air plasma at 100 W for 10 min. The use of air plasma, as opposed to pure O 2 makes it difficult to validate the current process from the results of Iannuzzi [55], however we think the ionic bombardment is a key factor in the plasma cleaning process, which can be achieved with Ar, O 2 , N 2 or air plasma [57]. Even mild processes (Ar at 40 W for 1 min) have been shown to dramatically reduce carbon contamination on metal surfaces [58].…”
Section: A Review Of Pre-encapsulation Cleaning Methodsmentioning
confidence: 96%
“…For the current study, IDCs were cleaned with air plasma at 100 W for 10 min. The use of air plasma, as opposed to pure O 2 makes it difficult to validate the current process from the results of Iannuzzi [55], however we think the ionic bombardment is a key factor in the plasma cleaning process, which can be achieved with Ar, O 2 , N 2 or air plasma [57]. Even mild processes (Ar at 40 W for 1 min) have been shown to dramatically reduce carbon contamination on metal surfaces [58].…”
Section: A Review Of Pre-encapsulation Cleaning Methodsmentioning
confidence: 96%