2002
DOI: 10.1103/physrevb.65.085206
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Role of interstitial hydrogen and voids in light-induced metastable defect formation in hydrogenated amorphous silicon: A model

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Cited by 50 publications
(33 citation statements)
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“…This gives support to the fact there is not only diffusion of molecular hydrogen, but also reconstruction of Si-H bonding during light-soaking [36], and molecular hydrogen should play an important role in this process [42].…”
Section: Hydrogen Exodiffusion Studiesmentioning
confidence: 83%
See 1 more Smart Citation
“…This gives support to the fact there is not only diffusion of molecular hydrogen, but also reconstruction of Si-H bonding during light-soaking [36], and molecular hydrogen should play an important role in this process [42].…”
Section: Hydrogen Exodiffusion Studiesmentioning
confidence: 83%
“…Such an active hydrogen evolution could be also explained by the existence of molecular hydrogen. Furthermore, a multi-body motion model has been proposed in which light-induced molecular hydrogen formation mediated by (another) interstitial molecular hydrogen [42]. In the model, atomic hydrogen comes to passivate a newly created dangling bond left by another atomic hydrogen parted from bond centered position, and two hydrogen atoms form a molecular hydrogen or interstitial hydrogen.…”
Section: Discussionmentioning
confidence: 99%
“…Кроме того, в аморфной сетке существуют более и менее упорядоченные области соответственно с меньшей и большей концентрацией водорода [2][3][4]. Такая сложная структура пленок a-Si : H дает возможность образования врожденных и фотоиндуцированных дефектов разных типов [5][6][7][8].…”
Section: Introductionunclassified
“…In addition, with increased temperature, BCH decays irreversibly and other known infrared active Si-H complexes begin to appear. Although several calculations and experiments describe the possible role of BCH as an intermediate stage in the dissociation of various Si-H bonds [1,15], direct experimental observation is not available.…”
Section: Introductionmentioning
confidence: 99%