2021
DOI: 10.1007/s11664-021-09017-0
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Role of Reduced Graphene Oxide-Gold Nanoparticle Composites on Au/Au-RGO/p-Si/Al Structure Depending on Sample Temperature

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Cited by 9 publications
(3 citation statements)
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“…The fabricated diode is not ideal due to the n value is larger than 1, and this can be related to the barrier inhomogeneity at the interface, the image force effects, and thin interface layer. [26][27][28][29] When different thicknesses of interface layer are deposited between the rectifier metal and the semiconductor, as the interfacial layer thickness increases, the charge carriers are less likely to tunnel, resulting in a high barrier height. 30 The ideality factor and barrier height values of Schottky diodes with organic interfacial layer prepared by means of n-Si semiconductor in literature were introduced in Table II.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The fabricated diode is not ideal due to the n value is larger than 1, and this can be related to the barrier inhomogeneity at the interface, the image force effects, and thin interface layer. [26][27][28][29] When different thicknesses of interface layer are deposited between the rectifier metal and the semiconductor, as the interfacial layer thickness increases, the charge carriers are less likely to tunnel, resulting in a high barrier height. 30 The ideality factor and barrier height values of Schottky diodes with organic interfacial layer prepared by means of n-Si semiconductor in literature were introduced in Table II.…”
Section: Resultsmentioning
confidence: 99%
“…To test the barrier homogeneity, many researchers have plotted the graph between barrier height and ideality factor. [26][27][28][29] The changes in both n and Φ b with temperature for Au/NAMA/n-Si Schottky diode are shown in Fig. 5.…”
Section: Resultsmentioning
confidence: 99%
“…Thus, the intensity ratio of the D and G bands of rGO (ID/IG=0.85), which indicates that hydroxyl, epoxy, and carboxyl of oxygen functional groups have been reduced from reduction process from GO to rGO via electrochemically deposition. Due to this process, it induced the defect in the structure as described in [31][29] [32].…”
Section: Results and Discussion 31 Characterization Of Rgo Filmmentioning
confidence: 99%