2022
DOI: 10.1007/s10854-022-08382-8
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Transfer of graphene thin film obtained by PECVD method to Au/p-Si rectifier junction as interfacial layer and analysis of its barrier characteristics depending on sample temperature

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Cited by 3 publications
(1 citation statement)
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“…Which includes RF magnetron sputtering [3], pulsed laser deposition [4], [5], spray pyrolysis [6], chemical bath deposition [7], electrodeposition [8], among others. While for high quality graphene thin films obtention, methods such as chemical vapor deposition [9], liquid phase exfoliation [10], and plasma chemical vapor deposition [11] are used. For graphene oxide thin film deposition is achieving by electrophoretic deposition (EPD) departing of aqueous dispersion of GO powders, which oxidation degree could be tune varying the EPD parameters.…”
Section: Introductionmentioning
confidence: 99%
“…Which includes RF magnetron sputtering [3], pulsed laser deposition [4], [5], spray pyrolysis [6], chemical bath deposition [7], electrodeposition [8], among others. While for high quality graphene thin films obtention, methods such as chemical vapor deposition [9], liquid phase exfoliation [10], and plasma chemical vapor deposition [11] are used. For graphene oxide thin film deposition is achieving by electrophoretic deposition (EPD) departing of aqueous dispersion of GO powders, which oxidation degree could be tune varying the EPD parameters.…”
Section: Introductionmentioning
confidence: 99%