2014
DOI: 10.1002/ange.201402513
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Room‐Temperature Carbide‐Derived Carbon Synthesis by Electrochemical Etching of MAX Phases

Abstract: Porous carbons are widely used in energy storage and gas separation applications, but their synthesis always involves high temperatures. Herein we electrochemically selectively extract, at ambient temperature, the metal atoms from the ternary layered carbides, Ti 3 AlC 2 , Ti 2 AlC and Ti 3 SiC 2 (MAX phases). The result is a predominantly amorphous carbide-derived carbon, with a narrow distribution of micropores. The latter is produced by placing the carbides in HF, HCl or NaCl solutions and applying anodic p… Show more

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Cited by 91 publications
(46 citation statements)
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References 34 publications
(33 reference statements)
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“…On the other hand, the remaining peak corresponds to C-C. The appearance of this C-C peak may be due to the selective dissolution of Ti at high temperatures, which leads to graphitic C-C [42,43]. All these results are indicative of the formation of the ZnO/Ti 3 C 2 T x hybrid structure.…”
Section: Bonding Statesmentioning
confidence: 93%
“…On the other hand, the remaining peak corresponds to C-C. The appearance of this C-C peak may be due to the selective dissolution of Ti at high temperatures, which leads to graphitic C-C [42,43]. All these results are indicative of the formation of the ZnO/Ti 3 C 2 T x hybrid structure.…”
Section: Bonding Statesmentioning
confidence: 93%
“…It is important to mention that 2D but less ordered CDC can be produced by extracting metals from other carbides chemically 3 or electrochemically. 17 …”
Section: ■ Graphenementioning
confidence: 97%
“…The former could be due to selective dissolution of Ti during etching, which can result in graphitic C-C formation. [51] The CH x , and C-O species, on the other hand, likely result from the solvents used in the separation and drying processes and/or the exposure of the high-surface area material to the ambient. Note that the percentages of C-C, CH x and C-O decrease to about 15 % of the photoemission in the C 1s region for the ap-Ti 3 C 2 T x sample after sputtering.…”
Section: S Regionmentioning
confidence: 99%