2015 Ieee Sensors 2015
DOI: 10.1109/icsens.2015.7370601
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Room temperature deposition of highly sensitive vanadium oxide films for infrared light sensing applications

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Cited by 3 publications
(2 citation statements)
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“…Table 1 offers a comparison between what presented here and the previous work in the field. We previously reported typical TCR values of -2.0%°C -1 for thin samples of less than 200nm in thickness [37]. We also observed a thickness dependence of the TCR response as well as the resistivity of annealed samples to be generally larger than those not subject to annealing.…”
Section: Introductionsupporting
confidence: 62%
“…Table 1 offers a comparison between what presented here and the previous work in the field. We previously reported typical TCR values of -2.0%°C -1 for thin samples of less than 200nm in thickness [37]. We also observed a thickness dependence of the TCR response as well as the resistivity of annealed samples to be generally larger than those not subject to annealing.…”
Section: Introductionsupporting
confidence: 62%
“…At the present time, vanadium oxide (VO x ) (~2%/K) [10][11][12][13][14][15][16] and doped amorphous silicon (a-Si) with TCR values of 2%-5%/K [17][18][19][20][21][22] are the two main materials used as thermosensing films in commercial microbolometers. However, amorphous silicon, usually doped with boron, is replacing vanadium oxide in large commercial arrays.…”
Section: Introductionmentioning
confidence: 99%