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Vanadium pentoxide thin films have been deposited on quartz substrates via sol-gel synthesis and dip coating. The process was developed to establish a reliable and inexpensive method to produce thin films with a high temperature coefficient of resistance (TCR) for sensing applications. Sol-gel precursor concentration and post-deposition annealing conditions were varied to address their effects on film composition, morphology, structure, resistivity, and TCR response. The resulting thin films were structurally characterized by thin film profilometry, x-ray diffraction, scanning electron microscopy, and Raman spectroscopy. Resistivity and TCR measurements were carried out to determine their efficacy as sensor materials. Both low and high concentration alkoxide sol-gel precursors led to films of pure α-V2O5 composition but with characteristically different structural and electrical properties. Low concentration films showed a modest decrease in resistivity and TCR with increasing annealing temperature, consistent with the formation of increasing grain size and the coalescence of largely planar grains with common crystalline orientation. In contrast, films fabricated from higher alkoxide precursor

In this paper we report on recrystallized amorphous hydrogenated germanium (a-Ge:H) thin film on polyimide to fabricate flexible near infrared (NIR) light sensitive resistors that can be used in flexible electronics. In this work we investigate the effect of pulsed excimer laser annealing of a-Ge:H thin films for fabrication of low temperature photo-detectors operating in the NIR

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