2011
DOI: 10.1063/1.3647572
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Room temperature direct gap electroluminescence from Ge/Si0.15Ge0.85 multiple quantum well waveguide

Abstract: We report room temperature direct gap electroluminescence (EL) from a Ge/Si0.15Ge0.85 multiple quantum well (MQW) waveguide. The excitonic direct gap transition and the dependence of the EL intensity on the injection currents and temperature are clearly observed. EL from the Ge/SiGe MQWs is shown to have a transverse-electric polarization. These results demonstrate the strong potential of the Ge/Si0.15Ge0.85 MQWs in terms of the realization of a monolithically integrated light source on the Si platform.

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Cited by 40 publications
(27 citation statements)
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“…These results are confirmed by room temperature electroluminescence (EL) measurements from a Ge/Si 0.15 Ge 0.85 QW waveguide [49]. Figure 6A shows the measured spectra without any temperature stabilization.…”
Section: Recombination Processes In Ge-rich Ge/sige Qw: Competition Bsupporting
confidence: 72%
See 1 more Smart Citation
“…These results are confirmed by room temperature electroluminescence (EL) measurements from a Ge/Si 0.15 Ge 0.85 QW waveguide [49]. Figure 6A shows the measured spectra without any temperature stabilization.…”
Section: Recombination Processes In Ge-rich Ge/sige Qw: Competition Bsupporting
confidence: 72%
“…When radiative carrier recombinations are considered, a competition occurs between direct and indirect recombinations. Different experimental works have been performed to compare these recombinations and to evaluate their dynamics, mainly using Ge/Si 0.15 Ge 0.85 MQW on Si 0.1 Ge 0.9 virtual substrates [47][48][49][50][51][52][53]. Photoluminescence (PL) has been investigated over a wide spectral range, and for different temperatures: from 5K to room temperature [47] and in the above room temperature range between 300-440K [48].…”
Section: Recombination Processes In Ge-rich Ge/sige Qw: Competition Bmentioning
confidence: 99%
“…At present, however, direct-gap electroluminescence [72][73][74][75] and lasing 67 in Ge-based heterostructures have been achieved only under high current densities and shown to be not efficient yet. 70,75 Such drawbacks strongly hamper the widespread application of Ge-based light sources.…”
Section: Discussionmentioning
confidence: 99%
“…2 Previous works have demonstrated electroluminescence from Ge p-i-n structures or other configurations grown on top of standard Si wafers. [3][4][5][6][7] Electroluminescence has also been demonstrated from Ge quantum well devices but so far the emission has been at wavelengths below 1.45 lm (Ref. 7) which is too low for the important 1.55 lm for telecoms.…”
mentioning
confidence: 99%
“…The substrate was degassed at 316 C for 10 min before loading into a low-energy plasma-enhanced chemical vapour deposition (LEPECVD) chamber. 7,10 The heterolayer design is shown in Fig. 1 followed by 3 nm of Si was grown to produce a Schottky top contact that would allow hot electron injection into the C-valley with the aim of producing more efficient direct recombination.…”
mentioning
confidence: 99%