Room-temperature fabrication of a three-dimensional porous silicon framework inspired by a polymer foaming process

Abstract

A room-temperature routine for the fabrication of a three-dimensional silicon porous framework inspired by a polymer foaming process is introduced. The obtained micron-sized pores can be further modified by hydrothermal growth of nanowires to form a hierarchical porous composite framework.

Boosting the Dynamic Range for Electrochemical Sensing of Hydrogen Peroxide by Enhanced Integration of Pd Nanoparticles in 3D Porous Si Framework

“…Meanwhile, open pores ranging from 30 nm to 200 nm start to accumulate on the surface. In the defect induced etching of SiNW array by HF/HNO 3 [26], the diameter expansion of pores was clearly observed, and the reaction time thus becoming a controlling parameter for average pore size. For HF/H 2 O 2 etching, however, it is the density rather than the diameter of pores increasing with prolonged time (Fig.2D, F, H, J).…”

“…Recently, we attempted to address this problem by introducing a room-temperature routine to fabricate 3D-pSi on silicon wafers directly [26]. Starting from MACE prepared Si nanowire array (MACE-SiNW), 3D-pSi can be subsequently prepared by isotropic etching induced by surface defects.…”