2017
DOI: 10.1016/j.actamat.2017.02.030
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Room temperature ferromagnetism and ferroelectricity in strained multiferroic BiFeO3 thin films on La0.7Sr0.3MnO3/SiO2/Si substrates

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Cited by 30 publications
(11 citation statements)
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“…Thin film is the most important material form for the fabrication of devices in the contemporary semiconductor industry, which can promote electronic devices toward miniaturization and integration. Numbers techniques have been developed to fabricate BFO thin film in past years, such as pulsed laser deposition (PLD), [ 2,29,36 ] radio‐frequency (RF) magnetron sputtering, [ 4,37,38 ] molecular beam epitaxy (MBE), [ 39,40 ] and metalorganic chemical vapor deposition (MOCVD), [ 41,42 ] as well as sol–gel/chemical‐solution deposition (CSD). [ 3,43,44 ] As shown in Table 1 , [ 2,4,24,29,30,36,38,41,43–61 ] which lists the reported BFO films with their observed polarization ( P )–electric field ( E ) loops, it has been demonstrated that the physical‐based processing, such as PLD or RF, can deposit relatively dense BFO thin films, that show lower leakage and defects.…”
Section: Current Research Status Of Csd Derived Bfo Filmsmentioning
confidence: 99%
See 1 more Smart Citation
“…Thin film is the most important material form for the fabrication of devices in the contemporary semiconductor industry, which can promote electronic devices toward miniaturization and integration. Numbers techniques have been developed to fabricate BFO thin film in past years, such as pulsed laser deposition (PLD), [ 2,29,36 ] radio‐frequency (RF) magnetron sputtering, [ 4,37,38 ] molecular beam epitaxy (MBE), [ 39,40 ] and metalorganic chemical vapor deposition (MOCVD), [ 41,42 ] as well as sol–gel/chemical‐solution deposition (CSD). [ 3,43,44 ] As shown in Table 1 , [ 2,4,24,29,30,36,38,41,43–61 ] which lists the reported BFO films with their observed polarization ( P )–electric field ( E ) loops, it has been demonstrated that the physical‐based processing, such as PLD or RF, can deposit relatively dense BFO thin films, that show lower leakage and defects.…”
Section: Current Research Status Of Csd Derived Bfo Filmsmentioning
confidence: 99%
“…BiFeO 3 (BFO), as a unique room‐temperature single‐phase multiferroic material, has undergone considerable investigations with a high ferroelectric Curie temperature of ≈ 1123 K and an antiferromagnetic Néel temperature of ≈650 K, [ 1–7 ] Thus, BFO is considered the most promising candidate for the next‐generation memory and spintronics among various multiferroic materials. In the past research, BFO shows versatile crystal structures and a broad richness of physical properties.…”
Section: Introductionmentioning
confidence: 99%
“…. The SPM behavior for the LSMO systems has been reported in studies on 12 nm single-domain nanoparticles obtained by joint deposition 16 or 20 nm multidomain nanoparticles prepared via sol-gel 28 ; but, as far as it has been possible to review, such behavior in LSMO thin films have only been reported in our own previous report 29 .…”
mentioning
confidence: 93%
“…The observed SPM state on the nanostructured LSMO layers can be associated to interacting ferromagnetic monodomain nanoregions, whose average size should be smaller than a certain critical size as a condition to transit from a macroscopic ferromagnetic interaction to a macroscopic paramagnetic behavior [27][28][29][30][31][32] . These nanoregions, delimited with dashed lines in Fig 4b,d, are induced by the local constrain of the SiO 2 surface as was discussed above, but without appreciable grain boundaries for both samples.…”
mentioning
confidence: 99%
“…As an effective approach, stress/strain engineering has been generally employed to regulate the microstructures [27,28] and properties of ferroelectric materials, such as ferroelectricity, [29][30][31][32] piezoelectricity, [33][34][35][36] energy-storage performance, [37][38][39] and ECE. [16,[40][41][42][43][44] Considering the practical application, the cooling temperature range of the ECE is mainly expected to be around room temperature.…”
Section: Introductionmentioning
confidence: 99%