A Pd/TiO 2 /n-type low-temperature-polysilicon (n-LTPS) MOS thin-film Schottky diode fabricated on a glass substrate for hydrogen sensing is reported. The n-LTPS is an excimer-laser-annealed and PH 3 -gas-plasma-treated amorphoussilicon (a-Si) thin film. At room temperature and −2-V bias, the developed MOS Schottky diode exhibited a high signal ratio of 1540 to 50 ppm of hydrogen gas, with a fast response time of 40 s, respectively. The signal ratio is better or comparable with that of other reported MOS-type hydrogen gas sensors prepared on Si or III-V compound substrate. In addition, the signal ratio is 7.6, 14, and 30 times over other interfering gases of C 2 H 5 OH, C 2 H 4 , and NH 3 at room temperature and a concentration of 8000 ppm at −2-V bias, respectively. Thus, the developed MOS Schottky diode shows promise for the future development and commercialization of a low-cost hydrogen sensor.Index Terms-Amorphous silicon (a-Si), excimer laser annealing (ELA), low-temperature polysilicon (LTPS), MIS, palladium.