Photoluminescence has been studied in silicon deformed
by four-point bending at temperature of 600◦C. So-called
dislocation-related luminescence lines D1, D2, D3 and D4 are
observed from both the sides of the deformed samples. It is
found that in the samples with the induced dislocation density
~10^7 cm^−2, a luminescence intensity of the D3 and D4 lines is
the same on both the sample sides, and the intensity of the D1
and D2 lines from the tensile side is higher than that from the
compressive side. Behavior of the intensity of the D1 and D2 lines
is well correlated with a quantity of dislocation trails. Possible
reasons of observed effect are discussed.