Room temperature oxidation of magnetron sputtered Si–C–N films

Hüger, Erwin; Gao, Di; Markwitz, A.; Geckle, Udo; Bruns, Michael; Schmidt, Harald

doi:10.1016/j.apsusc.2011.11.012

Cited by 3 publications

(8 citation statements)

References 28 publications

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“…The obtained reflectivity is a function of the optical constants, in this case resulting in a maximum where an absorption band was expected [49][50][51]53]. This has been observed for silicon wafers several times [46,[49][50][51]54].…”

Section: Chemical Compositionmentioning

confidence: 97%

“…Recently, proportionality between the integral of a non-transformed FTIR reflectance spectrum and the number of bonds of the measured vibrational state was proven [54]. Therefore, the same structural information can be extracted from reflectance FTIR spectra.…”

Section: Chemical Compositionmentioning

confidence: 98%

“…Reflectance FTIR spectroscopy has recently been applied to organic materials [46,52], soils [48], fuels [52], and inorganic materials [53,54]. This technique usually yields spectra of poorer quality than 7 PLH film (black).…”

Section: Chemical Compositionmentioning

confidence: 99%

“…Reflectance Fourier-transform infrared spectroscopy (FTIR) [46][47][48][49][50][51][52][53][54] was performed on dried (PLH/PGA) 8 films, deposited on bare silicon wafers, and gold-coated silicon wafers. Reflectance FTIR spectra recorded from films on substrates depend on the nature and kind of material of film and substrate, the film thickness as well as the incident angle and polarization of the IR radiation.…”

Section: Fourier-transform Infrared Spectroscopymentioning

confidence: 99%

“…The detection of the individual functional groups was carried out using IR-spectroscopy in reflectance geometry [46][47][48][49][50][51][52][53][54] with silicon and gold-coated silicon wafer substrates. Reflectance FTIR spectroscopy has recently been applied to organic materials [46,52], soils [48], fuels [52], and inorganic materials [53,54].…”

Section: Chemical Compositionmentioning

confidence: 99%

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Preparation and characterization of poly(l-histidine)/poly(l-glutamic acid) multilayer on silicon with nanometer-sized surface structures

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Section: Chemical Compositionmentioning

confidence: 97%

Section: Chemical Compositionmentioning

confidence: 98%

Section: Chemical Compositionmentioning

confidence: 99%

Section: Fourier-transform Infrared Spectroscopymentioning

confidence: 99%

Section: Chemical Compositionmentioning

confidence: 99%

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Lithium Transport through Nanosized Amorphous Silicon Layers

et al. 2013

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Lithium migration in nanostructured electrode materials is important for an understanding and improvement of high energy density lithium batteries. An approach to measure lithium transport through nanometer thin layers of relevant electrochemical materials is presented using amorphous silicon as a model system. A multilayer consisting of a repetition of five [(6)LiNbO3(15 nm)/Si (10 nm)/(nat)LiNbO3 (15 nm)/Si (10 nm)] units is used for analysis, where LiNbO3 is a Li tracer reservoir. It is shown that the change of the relative (6)Li/(7)Li isotope fraction in the LiNbO3 layers by lithium diffusion through the nanosized silicon layers can be monitored nondestructively by neutron reflectometry. The results can be used to calculate transport parameters.

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Enhanced Wettability, Hardness, and Tunable Optical Properties of SiCxNy Coatings Formed by Reactive Magnetron Sputtering

et al. 2023

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Silicon carbonitride films were deposited on Si (100), Ge (111), and fused silica substrates through the reactive magnetron sputtering of a SiC target in an argon-nitrogen mixture. The deposition was carried out at room temperature and 300 °C and at an RF target power of 50–150 W. An increase in the nitrogen flow rate leads to the formation of bonds between silicon and carbon atoms and nitrogen atoms and to the formation of SiCxNy layers. The as-deposited films were analyzed with respect to their element composition, state of chemical bonding, mechanical and optical properties, and wetting behavior. It was found that all synthesized films were amorphous and represented a mixture of SiCxNy with free carbon. The films’ surfaces were smooth and uniform, with a roughness of about 0.2 nm. Depending on the deposition conditions, SiCxNy films within the composition range 24.1 < Si < 44.0 at.%, 22.4 < C < 56.1 at.%, and 1.6 < N < 51.9 at.% were prepared. The contact angle values vary from 37° to 67°, the hardness values range from 16.2 to 34.4 GPa, and the optical band gap energy changes from 1.81 to 2.53 eV depending on the synthesis conditions of the SiCxNy layers. Particular attention was paid to the study of the stability of the elemental composition of the samples over time, which showed the invariance of the composition of the SiCxNy films for five months.

show abstract

Room temperature oxidation of magnetron sputtered Si–C–N films

Cited by 3 publications

References 28 publications

Preparation and characterization of poly(l-histidine)/poly(l-glutamic acid) multilayer on silicon with nanometer-sized surface structures

Preparation and characterization of poly(l-histidine)/poly(l-glutamic acid) multilayer on silicon with nanometer-sized surface structures

Lithium Transport through Nanosized Amorphous Silicon Layers

Enhanced Wettability, Hardness, and Tunable Optical Properties of SiCxNy Coatings Formed by Reactive Magnetron Sputtering

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