2006
DOI: 10.1063/1.2172867
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Room temperature rectifying characteristics of epitaxial Y1Ba2Cu3−xZnxO7−δ (x=0.0,0.2) and Nb:SrTiO3 (Nb: 0.05%, 0.1%, 0.5%) heterojunctions

Abstract: We report on the fabrication and electrical characterization of epitaxial metal-semiconductor junctions between Y1Ba2Cu3O7−δ (YBCO) (optimally doped and Zn doped) and (001) Nb:SrTiO3 with different Nb concentrations (0.05%, 0.1%, and 0.5%). The current-voltage characteristics of such epitaxial junctions are nonlinear and rectifying, and these are dramatically enhanced with decreasing Nb concentration and Zn doping. Indeed, for the case of 0.05% Nb:STO, reverse breakdown voltage as high as −18V(−28V) is realize… Show more

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Cited by 15 publications
(7 citation statements)
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“…This result implies that there is no Nb depletion layer formed at the interface during film growth. The good rectifying current-voltage characteristics of such epitaxial junctions reported previously can be intrinsically described from the Schottky junctions between the YBCO and the Nb-doped SrTiO 3 substrate [17].…”
Section: Resultsmentioning
confidence: 57%
See 1 more Smart Citation
“…This result implies that there is no Nb depletion layer formed at the interface during film growth. The good rectifying current-voltage characteristics of such epitaxial junctions reported previously can be intrinsically described from the Schottky junctions between the YBCO and the Nb-doped SrTiO 3 substrate [17].…”
Section: Resultsmentioning
confidence: 57%
“…The thin films of YBCO were grown at 200 m Torr oxygen pressure at the substrate temperature of 800 • C and then cooled to room temperature in oxygen pressure of 400 Torr. The detailed thin film growth procedures are provided in [17]. The T c (zero resistance) of the thin films was measured to be as high as ∼91 K with a sharp transition and the thin films showed the improved normal state properties, which are described elsewhere [18].…”
Section: Methodsmentioning
confidence: 97%
“…One route is where a hole-doped oxide is deposited on the n-type semiconductor oxide to form the p-n junctions. [1][2][3][4][5][6] The other route is where the oxide insulator is used to sandwich the semiconductor p-type oxide and semiconductor n-type oxide to prepare the p-I-n junctions. [7][8][9][10] To develop the oxide electronics based on the functional oxides, such as optimally doped oxide superconductors and manganite, the p-n junctions which are made from optimally doped oxides are necessary.…”
mentioning
confidence: 99%
“…Devices based on oxide-oxide interfaces, including Schottky and p-n junctions [3][4][5][6] and field-effect transistors (FETs) 7,8 are being extensively investigated. Significant progress has been achieved in the field-effect control of the carrier density of a superconducting cuprate using a FET device 9 and more recently using electric double layer (EDL) techniques.…”
mentioning
confidence: 99%