2011
DOI: 10.1016/j.orgel.2011.03.014
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Room-temperature solution-processed high-k gate dielectrics for large area electronics applications

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Cited by 15 publications
(17 citation statements)
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“…The pentacene OFET based on UV-cured BST reached a saturated state at −2.5 V gate bias, and the corresponding unit-area capacitance was 300 nF cm −2 . [84] Both p-type and n-type FETs turned on at 2 V gate bias, and the leakage current density was lower than 10 −8 A cm −2 in a 2 MV cm −2 electrical field. [102] Other approaches, such as reactive chemical reactions, [103] combustion fuels, [104] and dopant addition, [105] are also reported.…”
Section: Wwwadvancedsciencenewscommentioning
confidence: 99%
“…The pentacene OFET based on UV-cured BST reached a saturated state at −2.5 V gate bias, and the corresponding unit-area capacitance was 300 nF cm −2 . [84] Both p-type and n-type FETs turned on at 2 V gate bias, and the leakage current density was lower than 10 −8 A cm −2 in a 2 MV cm −2 electrical field. [102] Other approaches, such as reactive chemical reactions, [103] combustion fuels, [104] and dopant addition, [105] are also reported.…”
Section: Wwwadvancedsciencenewscommentioning
confidence: 99%
“…The local electric field and charge distribution in the new capacitors (fig. S2) are simulated using the finite element method [the dielectric constant value of Al 2 O 3 is around 9 ( 22 )], and the calculated capacitance for a 1-μm-thick membrane can reach up to 9.8 μF/cm 2 , being similar to that of the MIM capacitors ( 3 ).…”
Section: Resultsmentioning
confidence: 99%
“…It is widely used as a template to synthesize nanowire ( 18 , 19 ), nanotube ( 20 ), and nanocable ( 21 ) arrays. The fascinating features of nanoporous AAO, including a uniform pore wall thickness, hemispheric barrier layers at the pore bottom, and a high dielectric constant ( 22 ), can be applied in dielectric capacitors to enhance the performance. Furthermore, in comparison with deposited aluminum oxides such as by ALD, AAO could be a good option especially for MIM structures to achieve the expected lower current leakage and higher breakdown voltage ( 23 ).…”
Section: Introductionmentioning
confidence: 99%
“…Figure 3b, d shows a three-dimensional view for a better spatial comprehension. The Al 2 O 3 films grown by anodization has a quite irregular surface, that depend on the fabrication parameters [21]. The roughness is reduced by covering the Al 2 O 3 film with a PMMA thin layer, as can be seen in Fig.…”
Section: Analysis Of Sn Layer Evaporationmentioning
confidence: 99%