Roughness Evolution of Ion Sputtered Rotating InP Surfaces: Pattern Formation and Scaling Laws

Frost, Frank; Schindler, Axel; Bigl, F.

doi:10.1103/physrevlett.85.4116

Cited by 324 publications

(218 citation statements)

References 29 publications

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“…Similar results have been subsequently reported by Gago et al 8 for Si targets under normal incidence and, more generally, by Frost et al 9,10,11 for rotated InP, InSb and GaSb targets under oblique incidence (where as function of the inclination angle a variety of other patterns have also been observed). To theoretically explain the hexagonal ordering and taking advantage of earlier work by Elder et al 12,13 (cf.…”

Section: Introductionsupporting

confidence: 77%

“…This argument can be generalized: Separating the functional G[∇h] in Eq. (9) in terms that can be rewritten as the divergence of a flux, G F [∇h] = ∇ · j F , and terms G NF [∇h] that cannot, the corresponding transformation is determined by h(x, t) =ĥ(x, t)…”

Section: Transformation To a Local Equationmentioning

confidence: 99%

“…(9) and (10) can contain any combination of derivatives of h orĥ, respectively, but no explicit dependence on h orĥ. As subsequently useful observation, we note that Eq.…”

Section: Transformation To a Local Equationmentioning

confidence: 99%

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Continuum modeling of sputter erosion under normal incidence: Interplay between nonlocality and nonlinearity

Vogel

Linz

2005

Phys. Rev. B

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Under specific experimental circumstances, sputter erosion on semiconductor materials exhibits highly ordered hexagonal dot-like nanostructures. In a recent attempt to theoretically understand this pattern forming process, Facsko et al. [Phys. Rev. B 69, 153412 (2004)] suggested a nonlocal, damped Kuramoto-Sivashinsky equation as a potential candidate for an adequate continuum model of this self-organizing process. In this study we theoretically investigate this proposal by (i) formally deriving such a nonlocal equation as minimal model from balance considerations, (ii) showing that it can be exactly mapped to a local, damped Kuramoto-Sivashinsky equation, and (iii) inspecting the consequences of the resulting non-stationary erosion dynamics.

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Section: Introductionsupporting

confidence: 77%

Section: Transformation To a Local Equationmentioning

confidence: 99%

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Continuum modeling of sputter erosion under normal incidence: Interplay between nonlocality and nonlinearity

Vogel

Linz

2005

Phys. Rev. B

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“…This erodes a surface at different rates depending on the slope of the surface, so intricate two-dimensional structures can emerge. Currently, focused ion beam bombardment is used to micromachine tall, steep features 5,6 , and to sculpt nanopore single-biomolecule detectors 7,8 , while uniform ion bombardment of a flat surface is used to create semiconductor quantum dots from the linear instabilities that are excited [9][10][11] . The utility of these techniques is, however, limited.…”

Section: Introductionmentioning

confidence: 99%

Creating sharp features by colliding shocks on uniformly irradiated surfaces

Holmes-Cerfon¹,

Aziz²,

Brenner³

2012

Phys. Rev. B

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Using a theoretical analysis of the ion beam sputtering dynamics, we demonstrate how ion bombardment on an initially sloped surface can create knife-edge-like ridges on the surface. These ridges arise as nonclassical shock-like solutions that are undercompressive on both sides, and appear to control the dynamics over a large range of initial conditions. The slope of the ridges is selected uniquely by the dynamics, and can be up to 30 or more depending on the orientation dependence of the sputtering yield. For 1keV Ar + on Si(001), the scale of the ridge is ≈ 2nm. This is much smaller than the most unstable lengthscale and suggests a method for creating very steep, very sharp features on a surface spontaneously, by pre-patterning the surface to contain relatively modest slopes on the macroscale.

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“…Low-energy ion beam sputtering (IBS) is a powerful bottom-up technology for generating diverse self-organized nanostructures, such as ripples and dots on different materials including amorphous SiO 2 [1][2][3][4][5][6][7], single crystalline Si [8][9][10][11][12], Ge [10,13] and Ag [14], as well as compound semiconductors GaSb [15] and InP [16]; the IBS technology offers the potential to achieve high throughput and fabrication of large areas [10,[17][18][19]. Ion beam parameters (species, incidence angle, energy, flux, etc) and substrate parameters (material, temperature, initial surface topography, etc) interact to generate the features of such nanopatterns.…”

Section: Introductionmentioning

confidence: 99%

Nanostructures on fused silica surfaces produced by ion beam sputtering with Al co-deposition

et al. 2017

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The ion beam sputtering (IBS) of smooth mono-elemental Si with impurity co-deposition is extended to a pre-rippled binary compound surface of fused silica (SiO 2 ). The dependence of the rms roughness and the deposited amount of Al on the distance from the Al source under Ar + IBS with Al co-deposition was investigated on smooth SiO 2 , pre-rippled SiO 2 , and smooth Si surfaces, using atomic force microscopy and X-ray photoelectron spectroscopy. Although the amounts of Al deposited on these three surfaces all decreased with increasing distance from the Al target, the morphology and rms roughness of the smooth Si surface did not demonstrate a strong distance dependence. In contrast to smooth Si, the rms roughness of both the smooth and pre-rippled SiO 2 surfaces exhibited a similar distance evolution trend of increasing, decreasing, and final stabilization at the distance where the results were similar to those obtained without Al co-deposition. However, the pre-rippled SiO 2 surfaces showed a stronger modulation of rms roughness than the smooth surfaces. At the incidence angles of 60° and 70°, dot-decorated ripples and roof-tiles were formed on the smooth SiO 2 surfaces, respectively, whereas nanostructures of closely aligned grains and blazed facets were generated on the pre-rippled SiO 2 , respectively. The combination of impurity co-deposition with pre-rippled surfaces was found to facilitate the formation of novel types of nanostructures and morphological growth. The initial ripples act as a template to guide the preferential deposition of Al on the tops of the ripples or the ripple sides facing the Al wedge, but not in the valleys between the ripples, leading to 2D grains and quasiblazed grating, which offer significant promise in optical applications. The rms roughness enhancement is attributed not to AlSi, but to AlO x F y compounds originating mainly from the Al source.

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Roughness Evolution of Ion Sputtered Rotating InP Surfaces: Pattern Formation and Scaling Laws

Cited by 324 publications

References 29 publications

Continuum modeling of sputter erosion under normal incidence: Interplay between nonlocality and nonlinearity

Continuum modeling of sputter erosion under normal incidence: Interplay between nonlocality and nonlinearity

Creating sharp features by colliding shocks on uniformly irradiated surfaces

Nanostructures on fused silica surfaces produced by ion beam sputtering with Al co-deposition

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