1999
DOI: 10.1016/s0167-9317(99)00367-6
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RTS capture kinetics and Coulomb blockade energy in submicron nMOSFETs under surface quantization conditions

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Cited by 7 publications
(10 citation statements)
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“…14,15 At a certain level of downscaling the device size approaches a limit, at which one or several traps in the dielectric modulate the current. In this case, the signal as a function of time in the device demonstrates the RTS 8,14,[16][17][18][19] noise behavior. Analysis of the RTS spectra and time trace allows us to investigate the parameters of the individual traps of nanoscale devices.…”
Section: B 1/f Noise Spectroscopymentioning
confidence: 99%
See 2 more Smart Citations
“…14,15 At a certain level of downscaling the device size approaches a limit, at which one or several traps in the dielectric modulate the current. In this case, the signal as a function of time in the device demonstrates the RTS 8,14,[16][17][18][19] noise behavior. Analysis of the RTS spectra and time trace allows us to investigate the parameters of the individual traps of nanoscale devices.…”
Section: B 1/f Noise Spectroscopymentioning
confidence: 99%
“…(8), values of s c , and calculated concentrations, we estimate the capture cross-section of the single trap located in the gate dielectric to be not higher than 2 Â 10 À21 cm À2 , which corresponds to the repulsive trap. 14,18 Strong dependence of the capture cross-section on the frontgate voltage (see Fig. 12(b)) can be explained by a shift of the centroid of the inversion layer to the Si/SiO 2 interface with increasing surface potential, U s .…”
Section: F Single Trap Properties and Parametersmentioning
confidence: 99%
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“…An analysis of the measured data using the method described in Refs. 51,[60][61][62] shows that trap has a repulsive character due to the very small capture cross-section of 10 À20 cm 2 , and that its activation energy is equal to 0:47 eV. It should be noted that the capture cross-section in the case of the dielectric is typically several orders of magnitude smaller than for the bulk Si material trapping.…”
Section: Random Telegraph Signal Behavior Of Drain Currentmentioning
confidence: 95%
“…[9][10][11][12] Now, it is commonly considered that the decisive factors determining the strong current dependence of s c are electron distribution (perpendicular to the Si/SiO 2 interface) dependent on the high electric field near the interface 9 and Coulomb blockade effect. [10][11][12] On the other hand, it is shown by Mueller et al…”
Section: Introductionmentioning
confidence: 99%