Sample Target Substrates with Reduced Spot Size for MALDI‐TOF Mass Spectrometry Based on Patterned Self‐Assembled Monolayers

Herzer, Nicole; Eckardt, Rebecca; Hoeppener, Stephanie; Schubert, Ulrich S.

doi:10.1002/adfm.200801896

Cited by 14 publications

(10 citation statements)

References 26 publications

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“…The removal of the OTS monolayer and the preparation of micrometre structures in the UV-ozone photoreactor were previously reported and investigated in detail. 13 When, after the irradiation process, the photomask was removed, the surface of the slides showed a strong hydrophilic-hydrophobic contrast which resembled the structure of the used TEM grid photomasks: the bar structures remained hydrophobic, whereas the open spaces were hydrophilic and represented the characteristic hexagonal structure of the holes of the TEM grid. The patterns were then utilized for the electropolymerization of EDOT.…”

Section: Resultsmentioning

confidence: 96%

“…A possible approach to obtain micrometre-sized structures is the patterning of self-assembled monolayers of n-octadecyltrichlorosilane (OTS). These monolayers provide stable and transparent coatings which can be prepared easily and with reliable quality; they allow the efficient tailoring of surface properties, such as wettability, 13 chemical addressability, 14 or insulating properties. 15 A large number of structuring techniques have been employed for the patterning of self-assembled monolayers, e.g., soft lithography, photolithography, dip-pen and electro-oxidative as well as nanoimprint lithography.…”

Section: Introductionmentioning

confidence: 99%

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Fabrication of PEDOT–OTS-patterned ITO substrates

et al. 2010

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The fabrication of a poly(3,4-ethylenedioxythiophene) (PEDOT) pattern is demonstrated. As template, an n-octadecyltrichlorosilane (OTS) monolayer self-assembled on indium tin oxide (ITO) was structured by UV-ozone photolithography, resulting in an ITO-OTS patterned surface. The conducting properties of the ITO were utilized for the selective electropolymerization of 3,4-ethylenedioxythiophene (EDOT), whereby the electropolymerization was inhibited by the insulating OTS. Differently sized PEDOT-OTS patterns were obtained. The electronic properties of the patterns were finally evaluated in a test OLED device.

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Section: Resultsmentioning

confidence: 96%

Section: Introductionmentioning

confidence: 99%

Fabrication of PEDOT–OTS-patterned ITO substrates

et al. 2010

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“…A more pronounced inhibitory function of the gold mask for the hybrid chemical and photochemical UV–ozone treatment than for oxygen-plasma treatment may be the reason for the better quality of the obtained APTES SAM nanopatterns as evidenced by the detection of even the topographic features at a lateral resolution of 30 nm formed by the fluorescein-labeled 0.22 µm pattern. The use of mechanically rather stable, chemically bound SAMs as substrates for the processes [ 27 – 28 ] facilitates the procedures for contacting and removal of the masks. Here, contacting the mask by evaporation of a drop of water between the SAM and the flexible mask and dissolution of the backing plastic film leads to a good contact between the mask and the SAM.…”

Section: Discussionmentioning

confidence: 99%

Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

Fischer¹,

Hentschel²,

Fontein³

et al. 2014

Beilstein J. Nanotechnol.

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SummaryA general concept for parallel near-field photochemical and radiation-induced chemical processes for the fabrication of nanopatterns of a self-assembled monolayer (SAM) of (3-aminopropyl)triethoxysilane (APTES) is explored with three different processes: 1) a near-field photochemical process by photochemical bleaching of a monomolecular layer of dye molecules chemically bound to an APTES SAM, 2) a chemical process induced by oxygen plasma etching as well as 3) a combined near-field UV-photochemical and ozone-induced chemical process, which is applied directly to an APTES SAM. All approaches employ a sandwich configuration of the surface-supported SAM, and a lithographic mask in form of gold nanostructures fabricated through colloidal sphere lithography (CL), which is either exposed to visible light, oxygen plasma or an UV–ozone atmosphere. The gold mask has the function to inhibit the photochemical reactions by highly localized near-field interactions between metal mask and SAM and to inhibit the radiation-induced chemical reactions by casting a highly localized shadow. The removal of the gold mask reveals the SAM nanopattern.

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“…For this purpose the analyte was deposited by inkjet printing. 109 These selected examples demonstrate the broad applicability of photopatterned SAM systems and show, moreover, the wide diversity of structures and applications that can be targeted by the photochemical patterning of SAM systems. Potential further applications of patterned monolayers are seen, e.g., in microfluidics, sensor technology, wetting driven self-assembly and microelectronics.…”

Section: Photodegraded Surface Templates Of Samsmentioning

confidence: 96%

Fabrication of patterned silane based self-assembled monolayers by photolithography and surface reactions on silicon-oxide substrates

2010

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Self-assembled monolayers (SAMs) have received increasing attention since their introduction 30 years ago. Soon it was discovered that they can be used as alternative resist materials and are compatible with different established lithographic techniques commonly used in silicon semiconductor technology. Besides these possibilities to structure SAMs, other attractive properties emerged from the use of SAMs. E.g., the introduction of addressability into the patterns by selective functionalization with reactive precursor molecules and/or by applying suitable surface reactions was established. In this feature we highlight developments of photolithographic techniques that have been used in combination with SAMs serving either as resists for the patterning process or as precursor molecules for surface reactions, which can be performed on non-structured and mainly photochemically structured surfaces to obtain multifunctional surfaces with tunable surface properties. The aim is to provide an overview about the versatile possibilities to use silane based SAM systems to structure silicon-oxide substrates by introducing topographical as well as chemically heterogeneous surface structures. In particular the chemical activation of SAMs includes a large number of functionalization concepts which are intended to be summarized in this review. They will be introduced here according to the class of chemical reaction that has been used. Therefore, an introduction into the plethora of possible structures, which have been created by the combination of photolithographic structuring approaches, and the integration of tailor made surface functionalities into these systems will be highlighted. Additionally effective strategies to implement a diversity of chemical functionalities onto one substrate are summarized.

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Sample Target Substrates with Reduced Spot Size for MALDI‐TOF Mass Spectrometry Based on Patterned Self‐Assembled Monolayers

Cited by 14 publications

References 26 publications

Fabrication of PEDOT–OTS-patterned ITO substrates

Fabrication of PEDOT–OTS-patterned ITO substrates

Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

Fabrication of patterned silane based self-assembled monolayers by photolithography and surface reactions on silicon-oxide substrates

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