“…Various methods are used for the deposition of barrier layers in SOFC technology [ 21 , 22 ]: ceramic methods, such as screen-printing [ 23 ] and tape calendering [ 24 , 25 ]; vacuum deposition technologies, e.g., magnetron sputtering [ 26 , 27 ], pulsed laser deposition [ 10 , 28 ], and physical vapor deposition (PVD) [ 29 ]; aerosol-spraying methods under atmospheric [ 30 ] and reduced pressures [ 31 ]; and colloidal and solution technologies—electrophoretic deposition [ 32 , 33 ], dip-coating and sol-gel [ 34 , 35 ], suspension centrifugation [ 36 ] etc. One of the flexible, easy-to-implement, and cheap technologies is electrophoretic deposition (EPD), which does not require high-tech equipment and allows the deposition of coatings at room temperature in ambient air with a sufficiently high deposition rate of ~1–10 μm per 1 min [ 37 ].…”