Scaling Laws of the Ripple Morphology on Cu(110)

Rusponi, Stefano; Costantini, Giovanni; Boragno, C.; Valbusa, U.

doi:10.1103/physrevlett.81.4184

Cited by 170 publications

(135 citation statements)

References 32 publications

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“…Besides kinetic roughening, wavelike ripple structures may occur. Such height modulations on the submicron scale have been observed for crystalline semiconductors 1,2 as well as for crystalline metals 3,4 and some amorphous 5 and polycrystalline materials, see a recent review in Ref. 6.…”

Section: Introductionmentioning

confidence: 99%

“…Obviously, the Gaussian form is not universal and consequences of deviations from the Gaussian form within the BH model have not been studied yet. In particular, although the observations of ripples on single crystalline metals 3,15,16 are qualitatively described by the BH model, the latter is strictly a theory for amorphous materials, and thus there is a need to justify theoretically the emergence of such type of patterns onto this other class of substrates.…”

Section: Introductionmentioning

confidence: 99%

“…For non-metallic substrates, for example, one usually needs off-normal incidence of ion flux to produce ripples, which change their orientation with the incidence angle, 2,4,5,10,11,12,13,14 whereas ripples are observed on metallic substrates even at normal incidence, and the orientation of ripples changes with substrate temperature. 3,15,16 Furthermore, the smoothing mechanism of surface diffusion is not well understood yet. In previous simulations, 17 we have found that the emerging patterns depend crucially on the diffusion mechanisms applied.…”

Section: Introductionmentioning

confidence: 99%

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Influence of collision cascade statistics on pattern formation of ion-sputtered surfaces

et al. 2005

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Theoretical continuum models that describe the formation of patterns on surfaces of targets undergoing ion-beam sputtering, are based on Sigmund's formula, which describes the spatial distribution of the energy deposited by the ion. For small angles of incidence and amorphous or polycrystalline materials, this description seems to be suitable, and leads to the classic BH morphological theory [R. M. Bradley and J. M. E. Harper, J. Vac. Sci. Technol. A 6, 2390(1988]. Here we study the sputtering of Cu crystals by means of numerical simulations under the binary-collision approximation. We observe significant deviations from Sigmund's energy distribution. In particular, the distribution that best fits our simulations has a minimum near the position where the ion penetrates the surface, and the decay of energy deposition with distance to ion trajectory is exponential rather than Gaussian. We provide a modified continuum theory which takes these effects into account and explores the implications of the modified energy distribution for the surface morphology. In marked contrast with BH's theory, the dependence of the sputtering yield with the angle of incidence is non-monotonous, with a maximum for non-grazing incidence angles.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Influence of collision cascade statistics on pattern formation of ion-sputtered surfaces

et al. 2005

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“…These nanopatterns or ripple structures can also be produced by other methods such as erosion of materials by ion sputtering and by abrasive particles bombardment. Under off-normal ion-beam incidence, a periodic height modulation in the form of ripples or wavelike structures with submicron wavelength develops during low-energy ion bombardment of single crystalline Si (100) [1], single crystalline metals [2] and glasses [3]. Recently, Krok et.al. found that ion bombardment of InSb at an oblique angle of incidence led to the formation of wire-like structures on the surface with a diameter of tens of nanometers [4].…”

Section: Introductionmentioning

confidence: 99%

Tip-Induced Calcite Single Crystal Nanowear

Gunda

Volinsky

2007

MRS Proc.

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Wear behavior of freshly cleaved single crystal calcite (CaCO 3 ) was investigated by continuous scanning using the Hysitron Triboindenter in ambient environment as a function of scanning frequency (1 Hz -3 Hz) and contact load (2 µN -8 µN). At lower loads below 4 µN, initiation of the ripples takes place at the bottom of the surface slope, which continue to propagate up the slope as scanning progresses. The orientation of these ripple structures is perpendicular to the long scan direction. As the number of scans increases, ripples become fully developed, and their height and periodicity increase with the number of scans. At 6 µN normal load, tip-induced wear occurs as the tip begins removing the ripple structures with increased number of scan cycles. As the contact load increased further, ripples did not initiate and only tipinduced wear occurred on the surface, and saturated after 20 scans. At 1 Hz frequency wear takes place as material slides towards the scan edges when the tip moves back and forth. Material removal rate increased with contact load and it is observed that the number of scans required to create a new surface is inversely proportional to the contact load. Possible mechanisms responsible for the formation of ripples at higher frequencies are attributed to the slope of the surface, piezo hysteresis, system dynamics, or a combination of effects. The wear regime is due to abrasive wear. Single crystal calcite hardness of 2.8±0.3 GPa and elastic modulus of 75±4.9 GPa were measured using nanoindentation and used to determine the wear mode.

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“…The surface instability leading to rippling is caused by a competition between ion-induced roughening on one hand, and smoothing due to surface relaxation mechanisms such as surface diffusion on the other. Ripples have been produced on the surfaces of a variety of different materials including metals [1,2], semiconductors [3], and amorphous solids [4,5]. In addition, many different ion species and ion energies have been used [3,6] to form sputter ripples.…”

Section: Introductionmentioning

confidence: 99%

One and Two-Dimensional Pattern Formation on Ion Sputtered Silicon

et al. 2003

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The evolution of surface morphology during ion beam erosion of Si(111) at glancing ion incidence (60 o from normal, 500 eV Ar + , 0.75 mA/cm 2 collimated beam current) was studied over a temperature range of 500-730 o Celsius. Keeping ion flux, incident angle, and energy fixed, it was found that one-dimensional sputter ripples with wavevector oriented perpendicular to the projected ion beam direction form during sputtering at the lower end of the temperature range. For temperatures above approximately 690 o Celsius, growth modes both parallel and perpendicular to the projected ion beam direction contribute to the surface morphological evolution. This effect leads to the formation of bumps ("dots") with nearly rectangular symmetry.

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Scaling Laws of the Ripple Morphology on Cu(110)

Cited by 170 publications

References 32 publications

Influence of collision cascade statistics on pattern formation of ion-sputtered surfaces

Influence of collision cascade statistics on pattern formation of ion-sputtered surfaces

Tip-Induced Calcite Single Crystal Nanowear

One and Two-Dimensional Pattern Formation on Ion Sputtered Silicon

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