Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma

Purohit, Vishwas S.; Bhise, Ashok B.; Dey, Shirshendu; More, Mahendra A.; Dharmadhikari, C. V.; Joag, Dilip S.; Pasricha, Renu; Bhoraskar, S. V.

doi:10.1016/j.vacuum.2008.04.077

Cited by 7 publications

(5 citation statements)

References 17 publications

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“…From experimental set up as the value of refractive index varies from 1.6 to 1.9 and similarly band gap also observed its range was 3.22 to 3.9 eV. The correlative graph shown that both were gradually increase if oxygen flow rate increases [28].…”

Section: Fig 6 Effect Of Oxygen Flow Rate On Refractive Index and Ban...mentioning

confidence: 64%

An Influence of Oxygen Flow Rate on Structural, Optical and Tribological Properties of Molybdenum Oxide Thin Films

Dave

Patel

Chauhan

et al. 2021

AEF

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The influence of oxygen flow rate is examined on structural, optical and tribological properties of molybdenum oxide films deposited by reactive magnetron sputtering. The films were characterized by X-ray diffraction, scanning electron microscope (SEM), and contact angle measurement system. The optical properties of the films were measured by UV-Vis-NIR spectrophotometer and transmittance of ∼73% in the visible region of the spectrum was achieved. The band gap increases with increases in oxygen gas flow rate. AFM figure illustrates that the roughness of surface increases as oxygen flow rate increases. As oxygen increases wear rate and COF decreases while at the 18 sccm the lowest wear rate found.

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Section: Fig 6 Effect Of Oxygen Flow Rate On Refractive Index and Ban...mentioning

confidence: 64%

An Influence of Oxygen Flow Rate on Structural, Optical and Tribological Properties of Molybdenum Oxide Thin Films

Dave

Patel

Chauhan

et al. 2021

AEF

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“…In our experiments, no additional stimulation of hot electron production (such as surface current or IR radiation [27][28][29][30][31]) was employed. However, LMF emissivity of nanogranular metal thin films manifested without any additional energizing had been previously reported, e.g., by Purohit et al [86,87]. Moreover, several of the early experiments with MOS sandwich films discussed above employed relatively high magnitudes of extracting electric field applied to emitting structure surface: 5 kV/10 mm in [41], 1000 V/5 mm in [26], etc.…”

Section: Comparison With Literature Datamentioning

confidence: 85%

Low-Field Electron Emission Capability of Thin Films on Flat Silicon Substrates: Experiments with Mo and General Model for Refractory Metals and Carbon

et al. 2021

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Herein, we describe a study of the phenomenon of field-induced electron emission from thin films deposited on flat Si substrates. Films of Mo with an effective thickness of 6–10 nm showed room-temperature low-field emissivity; a 100 nA current was extracted at macroscopic field magnitudes as low as 1.4–3.7 V/μm. This result was achieved after formation treatment of the samples by combined action of elevated temperatures (100–600 °C) and the electric field. Morphology of the films was assessed by AFM, SEM, and STM/STS methods before and after the emission tests. The images showed that forming treatment and emission experiments resulted in the appearance of numerous defects at the initially continuous and smooth films; in some regions, the Mo layer was found to consist of separate nanosized islets. Film structure reconstruction (dewetting) was apparently induced by emission-related factors, such as local heating and/or ion irradiation. These results were compared with our previous data obtained in experiments with carbon islet films of similar average thickness deposited onto identical substrates. On this basis, we suggest a novel model of emission mechanism that might be common for thin films of carbon and refractory metals. The model combines elements of the well-known patch field, multiple barriers, and thermoelectric models of low-macroscopic-field electron emission from electrically nanostructured heterogeneous materials.

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“…The same ECR plasma reactor was used to deposit nano-crystalline diamond lms. 15 Appropriately biased hollow cathodic cylinders of Zn 16 and Mo 17 were introduced individually into ECR plasma to obtain oxide nanostructures and these nanostructures were further used for scanning tunneling microscopy (STM) studies. The ECR plasma source was used for the thin lm deposition of Ti and Fe-doped Ti, 18 as well as the surface modication of biocompatible polymers like poly(etherimide), 19 suitable for tissue engineering applications.…”

Section: Introductionmentioning

confidence: 99%

“…22 To widen the utility of the present ECR plasma reactor, the manuscript mainly focuses on the feasibility of utilizing it for materials processing, in particular, to tune the surface morphology for FEE applications. The feasibility of the earlier ECR plasma reactor was investigated using hollow cathode-biased cylinders of Mo 17 and Ag 23 introduced individually into the plasma reactor to obtain oxide nanostructures and further used in eld emission microscopy (FEM) studies. Similarly, Kar et al demonstrated the use of an ECR plasma reactor to grow carbon nanotubes on an Inconel substrate with varied process parameters to investigate the eld emission behaviour.…”

Section: Introductionmentioning

confidence: 99%

Structural and morphological tuning of iron oxide polymorphs by ECR plasma-assisted thermal oxidation

Raut

Premkumar

et al. 2020

RSC Adv.

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Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma

Cited by 7 publications

References 17 publications

An Influence of Oxygen Flow Rate on Structural, Optical and Tribological Properties of Molybdenum Oxide Thin Films

An Influence of Oxygen Flow Rate on Structural, Optical and Tribological Properties of Molybdenum Oxide Thin Films

Low-Field Electron Emission Capability of Thin Films on Flat Silicon Substrates: Experiments with Mo and General Model for Refractory Metals and Carbon

Structural and morphological tuning of iron oxide polymorphs by ECR plasma-assisted thermal oxidation

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