Secondary ion mass spectrometry characterization of IrO2-Ta2O5 thin films: effect of relative composition on electrode properties

Daolio, S.; Battisti, A. De; Fabrizio, M.; Nanni, Luca; Piccirillo, Clara

doi:10.1002/(sici)1097-0231(19981030)12:20<1574::aid-rcm352>3.0.co;2-p

Cited by 10 publications

(6 citation statements)

References 6 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Analyzing the ionic species listed in Table 1, many remarks can be made. As already observed, due to the sensitivity of SIMS,25 all the samples exhibited on the surfaces the presence of substrate species (Ti + , TiC + , Ti x O y + , Ni + , Ni x O y H z + , Si + , Al + ). This observation was ascribed to the interdiffusion and/or migration phenomena, because, as previously observed, the analysis by SIMS and the atomic force microscopy (AFM) micrographs, carried out on various areas of the same sample, showed films to exhibit continuous structures and homogeneity,1,, 2,, 23 without any evidence of uncovered zones.…”

Section: Resultssupporting

confidence: 65%

Secondary ion mass spectrometric investigation on ruthenium oxide systems: a comparison between poly- and nanocrystalline deposits

Barison

Barreca

Daolio

et al. 2000

Rapid Commun. Mass Spectrom.

View full text Add to dashboard Cite

Section: Resultssupporting

confidence: 65%

Secondary ion mass spectrometric investigation on ruthenium oxide systems: a comparison between poly- and nanocrystalline deposits

Barison

Barreca

Daolio

et al. 2000

Rapid Commun. Mass Spectrom.

View full text Add to dashboard Cite

“…All positive ion spectra appeared qualitatively similar, differing only for ion signals related to substrate materials. In fact, with SIMS analyses, the detection of inter-diffusion phenomena is quite common, because of the technique sensitivity. Likewise, in the light mass portion of ion spectra, several signals were detected and attributed to the inorganic/organic impurities, which definitely contaminated the samples during the synthesis process and whose ionic fragments are characterized by high yields.…”

Section: Resultsmentioning

confidence: 99%

A Ru(II) η³-Allylic Complex as a Novel Precursor for the CVD of Ru- and RuO₂-Nanostructured Thin Films

et al. 1999

Self Cite

View full text Add to dashboard Cite

An η 3 -allylic complex of ruthenium(II) is used as a precursor for the chemical vapor deposition (CVD) of Ru and RuO2 thin films at low temperatures. The depositions are carried out on R-Al2O3 and surfaceoxidized Si(100) in N2, N2 + H2, N2 + O2, or O2 flow to tailor the film composition from pure metal Ru to RuO2. The microstructure features of the samples are analyzed by X-ray diffraction and Raman spectroscopy, whereas their surface composition is studied by X-ray photoelectron spectroscopy. Surface and in-depth analyses of the coatings are also performed by secondary ion mass spectrometry, which allows to distinguish the composition of different coating regions along their thickness. The surface morphology and its dependence on the synthesis conditions are investigated by atomic force microscopy. The electrical and optical studies confirm the metallic character of Ru and RuO2 films.

show abstract

“…Several Co‐related signals were evidenced, in particular Co x O y + (x = 1–4, y = 0–4) clusters. Si + and In + peaks were also detected, thanks to the sensitivity of the technique 13. Considering that the structure of the film is continuous,9 their presence suggested intermixing phenomena, favored by the deposition temperatures.…”

Section: Resultsmentioning

confidence: 95%

An investigation of cobalt oxide based nanocrystalline thin films by secondary ion mass spectrometry

Barison

Barreca

Daolio

et al. 2001

Rapid Comm Mass Spectrometry

View full text Add to dashboard Cite

An investigation of cobalt oxide based nanocrystalline thin films by secondary ion mass spectrometry (SIMS) is presented. The coatings, whose composition ranged between CoO and Co 3 O 4 , were synthesized by chemical vapor deposition (CVD) on indium tin oxide (ITO) substrates, using cobalt(II) b-diketonate as precursor. The SIMS analysis revealed a satisfactory precursor conversion into the oxides and allowed distinction of regions in the films at different compositions. Filmsubstrate intermixing phenomena were evidenced and studied as a function of deposition temperature, film thickness and composition. Copyright # 2001 John Wiley & Sons, Ltd.Oxide-based materials show a broad spectrum of characteristics ranging from insulating to metallic, through optical, catalytic and superconducting properties 1 and, in this widespread context, nanocrystalline oxide based thin films have attracted a markedly growing interest in recent years. Nanocrystalline materials are usually defined as polycrystalline solids with particle diameters or grain sizes ranging from sub-nanometers up to 100 nm. As the crystal size decreases, there is a continuous transition from bulk to molecular properties with a number of effects being attributed to quantum confinement or more generally to restricted geometry. 2 These size effects are undoubtedly of outstanding importance in the fields of catalysis, gas sensors and semiconductor devices, whose functional properties are affected by various features, i.e. composition, grain size distribution, grain-grain and grain-substrate mutual interactions. and to obtain the necessary basis for thin films engineering, many techniques have to be used to attain a deeper insight into the structure-properties relations. With this aim, an extensive study has been devoted to the characterization of CoO-and Co 3 O 4 -based films obtained by chemical vapor deposition (CVD) from a Co(II) b-diketonate, Co(dpm) 2 (Hdpm = 2,2-6,6-tetramethyl-3,5-heptanedione) by means of XRD (X-ray diffraction), optical absorption, XPS (X-ray photoelectron spectroscopy), XE-AES (X-ray excited auger electron spectroscopy) and AFM (atomic force microscopy). 9,10In this work, a SIMS investigation is described, which enabled us (i) to verify the conversion degree of the organometallic precursor under the adopted conditions; (ii) to establish the composition and homogeneity of mixed deposits; (iii) to investigate the influence of the substrate material and the preparation conditions on the composition and thickness of the interface regions; and (iv) to detect eventual impurities due to film-substrate intermixing phenomena or to an unclean decomposition pattern of the employed precursor. SIMS, in fact, is a powerful and versatile analytical tool, as often demonstrated in the characterization of several oxide thin films. 11 EXPERIMENTAL Film preparationNanocrystalline cobalt oxide thin films were deposited in a cold-wall low-pressure custom-built CVD reactor using O 2 as the carrier gas as well as the oxidizing agent. The ITO substrate (indiu...

show abstract

Secondary ion mass spectrometry characterization of IrO2-Ta2O5 thin films: effect of relative composition on electrode properties

Cited by 10 publications

References 6 publications

Secondary ion mass spectrometric investigation on ruthenium oxide systems: a comparison between poly- and nanocrystalline deposits

Secondary ion mass spectrometric investigation on ruthenium oxide systems: a comparison between poly- and nanocrystalline deposits

A Ru(II) η³-Allylic Complex as a Novel Precursor for the CVD of Ru- and RuO₂-Nanostructured Thin Films

An investigation of cobalt oxide based nanocrystalline thin films by secondary ion mass spectrometry

Contact Info

Product

Resources

About

Secondary ion mass spectrometry characterization of IrO2-Ta2O5 thin films: effect of relative composition on electrode properties

Cited by 10 publications

References 6 publications

Secondary ion mass spectrometric investigation on ruthenium oxide systems: a comparison between poly- and nanocrystalline deposits

Secondary ion mass spectrometric investigation on ruthenium oxide systems: a comparison between poly- and nanocrystalline deposits

A Ru(II) η3-Allylic Complex as a Novel Precursor for the CVD of Ru- and RuO2-Nanostructured Thin Films

An investigation of cobalt oxide based nanocrystalline thin films by secondary ion mass spectrometry

Contact Info

Product

Resources

About

A Ru(II) η³-Allylic Complex as a Novel Precursor for the CVD of Ru- and RuO₂-Nanostructured Thin Films