Selective deposition of diamond films

Davidson, J.L.; Ellis, C.; Ramesham, R.

doi:10.1007/bf02657523

Cited by 80 publications

(16 citation statements)

References 12 publications

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“…On the other hand, selective growth of PCD films on previously patterned structures can be used to produce patterned diamond film-based structures, which can be achieved by selective nucleation of diamond or by masking the areas where growth is not desirable. SiO 2 was successfully used, as a masking layer, by Masood et al [102], Roppel et al [103] and Davidson et al [104]. Patterned amorphous Si masking method was also reported [105].…”

Section: Patterning Of Pcd Films For Mems Fabricationmentioning

confidence: 99%

Review on advances in microcrystalline, nanocrystalline and ultrananocrystalline diamond films-based micro/nano-electromechanical systems technologies

Auciello

Aslam

2021

J Mater Sci

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A comprehensive review is presented on the advances achieved in past years on fundamental and applied materials science of diamond films and engineering to integrate them into new generations of microelectromechanical system (MEMS) and nanoelectromechanical systems (NEMS). Specifically, the review focuses on describing the fundamental science performed to develop thin film synthesis processes and the characterization of chemical, mechanical, tribological and electronic properties of microcrystalline diamond, nanocrystalline diamond and ultrananocrystalline diamond films technologies, and the research and development focused on the integration of the diamond films with other film-based materials. The review includes both theoretical and experimental work focused on optimizing the films synthesis and the resulting properties to achieve the best possible MEMS/NEMS devices performance to produce new generation of MEMS/NEMS external environmental sensors and energy generation devices, human body implantable biosensors and energy generation devices, electron field emission devices and many more MEMS/NEMS devices, to produce transformational positive impact on the way and quality of life of people worldwide.

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Section: Patterning Of Pcd Films For Mems Fabricationmentioning

confidence: 99%

Review on advances in microcrystalline, nanocrystalline and ultrananocrystalline diamond films-based micro/nano-electromechanical systems technologies

Auciello

Aslam

2021

J Mater Sci

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“…Despite these advantages, there are many technological problems that complicate the widespread use of diamond coatings and impose a restriction on their use in technological processes (such as obtaining the necessary topology and dimensions for manufacture of the matrix radiation detectors and diamond RF (radio-frequency) electronics) [4,5]. Because of the synthesis-specific and high complexity of processing single-crystal diamond (such as a strong chemical and wear resistance), the creation of electronic structures with complex geometry using diamond is complex and not suitable for mass production or industrial processes [1,2,6]. As a result, developments are being made in the field of polycrystalline rather than single crystal coatings.…”

Section: Introductionmentioning

confidence: 99%

Deposition and Patterning of Polycrystalline Diamond Films Using Traditional Photolithography and Reactive Ion Etching

2017

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Abstract:Given the exceptional characteristics of diamond films, they have become increasingly popular in the fields of medicine, microelectronics, and detector electronics. However, despite all the advantages, there are many technological problems that complicate their widespread application and impose limitations on diamond use in technological processes. In this study, we proposed a new technique for obtaining a complex topology of polycrystalline diamond coatings by selective seeding of the substrate by nucleation centers and subsequent surface treatment with reactive ion etching to reduce the number of parasitic particles. As a result, diamond films were obtained with a high particle concentration in the film region and high repeatability of the pattern. Moreover, parasitic particles influenced neutralization in areas where film coverage was not needed. The effect of the diamond nanoparticle concentration in a photoresist and the effect of reactive ion etching on the formation of a continuous film and the removal of parasitic nucleation centers were examined. The relative simplicity, low power consumption, and high efficiency of this method make it attractive for both industrial and scientific applications.

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“…The treatment of the diamond surface is a complicated and labour intensive process [4]. The most difficulties are caused by the diamond resistance to different physical and chemical effects.…”

Section: Introductionmentioning

confidence: 99%

Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology

Okhotnikov¹,

Линник²,

Gaydaychuk³

2016

AIP Conference Proceedings

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Selective deposition of diamond films

Cited by 80 publications

References 12 publications

Review on advances in microcrystalline, nanocrystalline and ultrananocrystalline diamond films-based micro/nano-electromechanical systems technologies

Review on advances in microcrystalline, nanocrystalline and ultrananocrystalline diamond films-based micro/nano-electromechanical systems technologies

Deposition and Patterning of Polycrystalline Diamond Films Using Traditional Photolithography and Reactive Ion Etching

Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology

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