1999
DOI: 10.1021/la990020i
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Selective Etching of Semicrystalline Polymers:  CF4 Gas Plasma Treatment of Poly(ethylene)

Abstract: A series of poly(ethylene) (PE) films with different degrees of crystallinity was treated with a radio-frequency tetrafluoromethane (CF4) gas plasma (48−49 W, 0.06−0.07 mbar, and continuous vs pulsed treatment). The etching behavior and surface chemical and structural changes of the PE films were studied by weight measurements, X-ray photoelectron spectroscopy (XPS), static and dynamic water contact angle measurements, scanning electron microscopy (SEM), and atomic force microscopy (AFM). With increasing cryst… Show more

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Cited by 114 publications
(70 citation statements)
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“…At the surface of CF 4 pulse-treated CTA the amount of fluorine was lower than that for continuously treated membranes. Results from a previous paper on CF 4 plasma treatment of low-density poly(ethylene) (LDPE) films confirm that pulsed-treatment causes somewhat less fluorination (26). Also, some silicium was exposed at the surface of the pulse treated CTA membrane, which is similar to the values found for untreated or short CO 2 plasma-treated membranes (<2 min).…”
Section: Surface Analysis Of the Membranes' Top Layersupporting
confidence: 77%
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“…At the surface of CF 4 pulse-treated CTA the amount of fluorine was lower than that for continuously treated membranes. Results from a previous paper on CF 4 plasma treatment of low-density poly(ethylene) (LDPE) films confirm that pulsed-treatment causes somewhat less fluorination (26). Also, some silicium was exposed at the surface of the pulse treated CTA membrane, which is similar to the values found for untreated or short CO 2 plasma-treated membranes (<2 min).…”
Section: Surface Analysis Of the Membranes' Top Layersupporting
confidence: 77%
“…No significant differences of surface structure could be found between pulse-treated (900 × 1 s) and continuously treated (15 min) CTA membranes. This indicates that, the actual plasma time of both treatments being the same (900 s), the total etch effect on the surface structure is also similar, despite the fact that the conditions for pulsed treatment were much milder (26). Figure 3 shows that CF 4 plasma treatment had a completely different effect on the surface structure of the membrane's top layer.…”
Section: Surface Analysis Of the Membranes' Top Layermentioning
confidence: 88%
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“…The plasma treatment of the HDPE roughens the surface because of selective etching in which amorphous phase is being etched faster than the crystalline phase. 44 The plasma interacts with HDPE leading to carbon-carbon bond scissions and creates oxygen-containing hydrophilic functional groups (e.g., C¼ ¼O and COOH) on the HDPE surface. 45 Plasma treated (30 s at 200 W) surface of HDPE becomes hydrophilic observed as a decrease in water contact angle from 97 (S1) to 50 (S4) ( Table II).…”
Section: Resultsmentioning
confidence: 99%