2013 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS) 2013
DOI: 10.1109/csics.2013.6659244
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Selective Growth of Diamond in Thermal Vias for GaN HEMTs

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Cited by 15 publications
(4 citation statements)
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“…Synthetic diamond is deposited using chemical vapor deposition (Seki 2.45 GHz with microwave plasma immersion) to line microcavities in the SiC beneath the HEMT [30] to provide a low resistance thermal conduit from the device to fluid interface as shown in figure 5. Coolant is supplied from a fixture into a micro-machined manifold inlet.…”
Section: Near Junction Coolingmentioning
confidence: 99%
“…Synthetic diamond is deposited using chemical vapor deposition (Seki 2.45 GHz with microwave plasma immersion) to line microcavities in the SiC beneath the HEMT [30] to provide a low resistance thermal conduit from the device to fluid interface as shown in figure 5. Coolant is supplied from a fixture into a micro-machined manifold inlet.…”
Section: Near Junction Coolingmentioning
confidence: 99%
“…The wafer is then seeded with nano-diamond particles and a thin, conformal, nucleation layer is grown. The backside diamond is then etched from all regions except the thermal vias and an additional CVD diamond deposition is completed to further fi II the thermal vias [26], with a projected 3.1 x improvement in RF output power per unit area while maintaining similar junction temperatures as the baseline GaN-on-SiC HEMT. Through effort within NJTT, a process to deposit diamond within thermal vias was developed, with future electrical and thermal characterization the subject of the DARPA ICECool and the DARPA Diamond Round Robin programs.…”
Section: Diamond Grown In Viasmentioning
confidence: 99%
“…15 With the diamond-filled thermal via , the rise in the junction temperature of the GaN high-electron-mobility transistor could be suppressed by >30%. 16 In this study, through-vias were formed in the β-Ga 2 O 3 substrate using ultraviolet (UV) laser drilling, and the inner parts were subsequently filled with highly thermally conductive Cu (400 W m −1 K −1 ) using electroplating. 17 The use of high-energy UV laser drilling offers numerous advantages such as high etch rates, high-aspect ratios, and mask-less patterning.…”
Section: Introductionmentioning
confidence: 99%