The employment of
self-assembly of soft materials has been accepted
as an inexpensive, robust, and reliable patterning method. As their
self-assembly relies on the delicate molecular interactions near the
substrate, a precise prediction/control of the interface structure
and dynamics is critical to achieve desired nanostructures. Herein,
a polymeric nanomosaic (PNM) pattern is created from the air/water
interfacial self-assembly of a block copolymer (BCP) and introduced
as an effective interfacial energy control for substrates. As a demonstration,
the PNM coating is employed to control the BCP film structures. The
perpendicular orientation of BCP self-assembly, which requires neutral
wetting conditions for both blocks, is difficult to achieve but can
readily be obtained with the PNM coating upon a fine resolution of
the pattern quality. The universal applicability of the PNM coating
as an interfacial control has been confirmed on curved, flexible,
and three-dimensional substrates. In addition, the PNM is introduced
as an etching-free and reusable topcoat imparting free surface neutralization
even for the high-χ BCP nanopatterning.