2011
DOI: 10.1063/1.3583673
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Self-assembled ordered arrays of nanoscale germanium Esaki tunnel diodes

Abstract: We have self-assembled regimented arrays of vertical ∼100 nm diameter Ge Esaki tunnel diodes using nanosphere lithography. Measurements of the current-voltage characteristics of individual nanodiodes using conductive atomic force microscopy at room temperature reveal pronounced negative differential resistance under forward bias, with a peak to valley ratio of 2–4. These diode arrays could constitute a neuromorphic circuit architecture exhibiting collective computational activity.

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Cited by 4 publications
(1 citation statement)
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“…Various material stacks have been used in Esaki diodes, including Si, Ge, SiGe, III-V, and their heterostructures [59][60][61][62][63][64][65]. Peak current density up to 2.2 MA cm −2 has been demonstrated in Esaki diodes based on InAs/GaSb heterojunctions [61].…”
Section: Esaki Diodesmentioning
confidence: 99%
“…Various material stacks have been used in Esaki diodes, including Si, Ge, SiGe, III-V, and their heterostructures [59][60][61][62][63][64][65]. Peak current density up to 2.2 MA cm −2 has been demonstrated in Esaki diodes based on InAs/GaSb heterojunctions [61].…”
Section: Esaki Diodesmentioning
confidence: 99%