Self-ion bombarded Cr films: Crystallographic orientation and oxidation behaviour

Hu, Ming; Shen, Mingli; Liu, Zhengliang; Guo, Chuwen; Li, Qiang; Zhu, Shenglong

doi:10.1016/j.corsci.2018.08.016

Cited by 29 publications

(7 citation statements)

References 39 publications

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“…A preferred orientation of (211) and (200) planes is evident in samples # 5 and 9, respectively (highlighted in red bold in Table 6 ). The analysis would infer that the process parameters are able to alter the crystal growth orientation of the Cr coatings, which was also confirmed in other studies [ 48 , 49 , 63 ].…”

Section: Resultssupporting

confidence: 84%

“…This will result in a greater average remaining energy in particles after reaching the substrate surface. The energy is enough for the adsorbed Cr atoms to overcome the barrier of the (211) plane, and to promote their diffusion, migration and lattice arrangement on the substrate surface [ 63 ], allowing growth of those planes ( Figure S9a ).…”

Section: Discussionmentioning

confidence: 99%

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An Orthogonal Experimental Study on the Preparation of Cr Coatings on Long-Size Zr Alloy Tubes by Arc Ion Plating

Chen

Wang

et al. 2022

Materials

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Cr-coated Zr alloys are widely considered the most promising accident-tolerant fuel (ATF) cladding materials for engineering applications in the near term. In this work, Cr coatings were prepared on the surfaces of 1400 mm long N36 cladding tubes using an industrial multiple arc source system. Orthogonal analyses were conducted to demonstrate the significance level of various process parameters influencing the characteristics of coatings (surface roughness, defects, crystal orientation, grain structure, etc.). The results show that the arc current mainly affects the coating deposition rate and the droplet particles on the surface or inside the coatings; however, the crystal preferred orientation and grain structure are more significantly influenced by the gas pressure and negative bias voltage, respectively. Then, the underlying mechanisms are carefully discussed. At last, a set of systemic methods to control the quality and microstructures of Cr coatings are summarized.

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Section: Resultssupporting

confidence: 84%

Section: Discussionmentioning

confidence: 99%

An Orthogonal Experimental Study on the Preparation of Cr Coatings on Long-Size Zr Alloy Tubes by Arc Ion Plating

Chen

Wang

et al. 2022

Materials

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“…It has relatively high hardness, good electrical resistivity, and good chemical stability by the formation of dense chromia layers [1]. Thus, Cr is commonly employed as protective coating or film for metal parts at aggressive friction condition, corrosion, and high-temperature oxidation [2]. Generally, Cr coatings are fabricated by electroplating [3,4] and physical vapor deposition (PVD) [2,[5][6][7][8].…”

Section: Introductionmentioning

confidence: 99%

“…Thus, Cr is commonly employed as protective coating or film for metal parts at aggressive friction condition, corrosion, and high-temperature oxidation [2]. Generally, Cr coatings are fabricated by electroplating [3,4] and physical vapor deposition (PVD) [2,[5][6][7][8]. However, the traditional Cr plating process uses a highly toxic CrO 3 electrolyte, and a large amount of waste liquid discharges cause serious pollution to the environment.…”

Section: Introductionmentioning

confidence: 99%

“…Generally, the high self-ion bombardment or re-sputtering effect in PVD method would reduce deposition rate and change the film microstructure. For instance, intense ion bombardment was reported to induce preferred (200) orientation of Cr films deposited by using arc ion-plating [2]. As reported by Sidelev [7], hot target magnetron sputtering was taken to decrease the re-sputtering effect during Cr film growing and reduce the loss of deposition rate.…”

Section: Introductionmentioning

confidence: 99%

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Microstructure, Micro-Indentation, and Scratch Behavior of Cr Films Prepared on Al alloys by Using Magnetron Sputtering

Zhang

Yan

et al. 2019

Metals

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In this study, closed-field unbalanced magnetron sputtering (CFUMS) was employed to deposit pure Cr films on soft substrate of 2024 Al alloy. The effects of deposition powers and biases on the microstructures and mechanical performance of Cr films were systematically investigated by using X-ray diffraction (XRD), scanning electron microscope (SEM), micro-indentation and scratch test. Results showed that all the Cr films had a strong (110) preferred orientation and anisotropic surface morphology with columnar structures. The size of Cr particles was in the range of 50–350 nm, increasing with larger target power and higher biases. The hardness of Cr films was between 3.3 and 4.8 GPa, which was much higher than the Al alloy substrate (1.44 GPa). The Young’s modulus of Cr film could reach a maximum value of 169 GPa at 2.0 kW/70 V. The critical load increased when increasing the power but decreased with higher bias, achieving a maximum value of 53.83 N at 2.0 kW/10 V. The adhesive failure mechanism of Cr film was mainly attributed to the plastic deformation of softer Al substrate.

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High vacuum arc ion plating Cr films: Self-ion bombarding effect and oxidation behavior

Shen

et al. 2021

Corrosion Science

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Self-ion bombarded Cr films: Crystallographic orientation and oxidation behaviour

Cited by 29 publications

References 39 publications

An Orthogonal Experimental Study on the Preparation of Cr Coatings on Long-Size Zr Alloy Tubes by Arc Ion Plating

An Orthogonal Experimental Study on the Preparation of Cr Coatings on Long-Size Zr Alloy Tubes by Arc Ion Plating

Microstructure, Micro-Indentation, and Scratch Behavior of Cr Films Prepared on Al alloys by Using Magnetron Sputtering

High vacuum arc ion plating Cr films: Self-ion bombarding effect and oxidation behavior

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