1996
DOI: 10.1063/1.116575
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Self-organization processes of InGaAs/GaAs quantum dots grown by metalorganic chemical vapor deposition

Abstract: In 0.5 Ga 0.5 As/GaAs ͑001͒ quantum dots ͑QDs͒ were grown by metalorganic chemical vapor deposition ͑MOCVD͒ on exactly ͑001͒ oriented substrates using the Stranski-Krastanow growth mode. The dot density and their relative geometrical arrangement are found to be strongly dependent on the substrate temperature. The dots have identical square shaped bases oriented along ͗100͘. For high densities a preferential relative alignment of the dots along the ͗110͘ directions is found. These dots tend to be arranged in a … Show more

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Cited by 99 publications
(39 citation statements)
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“…They are often observed being self-similar and can be formed by self-organized growth on surfaces [9][10][11]. Single QDs enable novel devices for quantum cryptography, quantum information processing, and novel dynamic random access memories (DRAM)/flash memory cells [13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%
“…They are often observed being self-similar and can be formed by self-organized growth on surfaces [9][10][11]. Single QDs enable novel devices for quantum cryptography, quantum information processing, and novel dynamic random access memories (DRAM)/flash memory cells [13][14][15][16].…”
Section: Introductionmentioning
confidence: 99%
“…The wetting layer transition in these binaryternary dots is closer in energy to the QD ground state as compared to pure InAs/GaAs dots, but the energy separation of 110 meV is still significantly above k B T at room temperature. 8,9 The SI-SHB experiment uses the bleaching of the ground-state excitonic absorption induced by an optical pulse at 1.08 m wavelength traveling through the sample, resulting in an increased transmission of the pulse through the waveguide. The transmitted pulse is measured by a cooled Ge detector using a lock-in technique.…”
mentioning
confidence: 99%
“…Thus, the real wafer surface temperature for a full 2" wafer is increased compared to a quarter wafer for the same set process temperature. This is an important finding for all highly optimized nanostructure growth processes as QD formation are particularly well known to be highly temperature sensitive [Hei96]. The influence of wafer size change on optical properties of a highly optimized five-fold 1.3 µm QD stack is shown in Figure 5.…”
Section: Substrate Size Effectsmentioning
confidence: 78%