We present an optimized approach
for the deposition of Al2O3 (as a model secondary
material) coating into high aspect
ratio (≈180) anodic TiO2 nanotube layers using the
atomic layer deposition (ALD) process. In order to study the influence
of the diffusion of the Al2O3 precursors on
the resulting coating thickness, ALD processes with different exposure
times (i.e., 0.5, 2, 5, and 10 s) of the trimethylaluminum (TMA) precursor
were performed. Uniform coating of the nanotube interiors was achieved
with longer exposure times (5 and 10 s), as verified by detailed scanning
electron microscopy analysis. Quartz crystal microbalance measurements
were used to monitor the deposition process and its particular features
due to the tube diameter gradient. Finally, theoretical calculations
were performed to calculate the minimum precursor exposure time to
attain uniform coating. Theoretical values on the diffusion regime
matched with the experimental results and helped to obtain valuable
information for further optimization of ALD coating processes. The
presented approach provides a straightforward solution toward the
development of many novel devices, based on a high surface area interface
between TiO2 nanotubes and a secondary material (such as
Al2O3).