1998
DOI: 10.1007/s003390050808
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SEM investigation of pillared microstructures formed by electrochemical anodization

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Cited by 18 publications
(11 citation statements)
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“…The pore separation and cell diameter were estimated from micrographs of pillar arrays produced as in [6]. These quantities were found to have close values and to vary as the barrier-layer thickness of the cells.…”
Section: Resultsmentioning
confidence: 99%
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“…The pore separation and cell diameter were estimated from micrographs of pillar arrays produced as in [6]. These quantities were found to have close values and to vary as the barrier-layer thickness of the cells.…”
Section: Resultsmentioning
confidence: 99%
“…Aside from fragmentation, the stress imparts a degree of order to the spatial distribution of oxide grains. This phenomenon is employed in the two-step technique of making homogeneous anodic-oxide films containing a pore array [5,6].…”
Section: Resultsmentioning
confidence: 99%
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“…Способ формирования низкоразмерных структур путем анодирования слоев вентильных металлов (Ti, Ta, Nb, Hf, Zr, W) через поры анодного оксида алюминия (АОА) известен довольно давно [1][2][3], однако получил интенсивное развитие в последние годы благодаря открывающимся перспективам применений систем таких наноструктур в новых элементах микро-, нано-и оптоэлектроники [4][5][6][7][8]. Создавая маску из АОА заданных размеров и подбирая специальные условия и режимы, можно создавать металлоксидные наноструктуры специфической формы (холмики, столбики, колонны c модулированным диаметром [9] и т.…”
Section: Introductionunclassified
“…On the other hand, AAO formation on metal substrate with overlying Al film produces rather interesting biphasic microstructure. 16,17 Experiments of anodization on superimposed binary metals have been performed extensively to elucidate cationic transport mechanism in oxide barrier films. 18,19 In analyzing the Al-Ta and Al-Nb systems, Mozalev et al have provided invaluable insights on the mechanism responsible for nanostructure formation.…”
Section: Introductionmentioning
confidence: 99%