1990
DOI: 10.1016/0013-4686(90)90030-4
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Semiconducting and electrocatalytic properties of sputtered cobalt oxide films

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1990
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Cited by 88 publications
(50 citation statements)
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“…amidinates and cyclodexrtins) are now also proposed as the precursors (Li et al, 2008;Papadopoulos et al, 2010). The sputtering process, in turn, was conducted in the presence of pure Co or Co 3 O 4 as targets and plasma generated in a gas mixture containing O 2 (Ingler Jr et al, 2006;Schumacher et al, 1990 (Jiao & Frei, 2009). This report aroused great scientific interest.…”
Section: Water Splitting Systemsmentioning
confidence: 99%
“…amidinates and cyclodexrtins) are now also proposed as the precursors (Li et al, 2008;Papadopoulos et al, 2010). The sputtering process, in turn, was conducted in the presence of pure Co or Co 3 O 4 as targets and plasma generated in a gas mixture containing O 2 (Ingler Jr et al, 2006;Schumacher et al, 1990 (Jiao & Frei, 2009). This report aroused great scientific interest.…”
Section: Water Splitting Systemsmentioning
confidence: 99%
“…Moreover, they have also been used in oxygen evolution, reduction reactions, ion exchange process [8][9][10][11][12][13][14][15][16][17][18][19][20], and design of modified electrodes aiming at the application in electrooxidation of chemicals such as carbohydrates and thiols, hydrogen peroxide, aspirin and acetaminophen, hydroquinone and alcohols [21][22][23][24][25][26][27]. To fabricate cobalt oxide nanostructures, various synthesis methods, e.g., spray pyrolysis, sonication assisted methods, sputtering, thermal salt decomposition, powder immobilization, irradiation, sol-gel technique [28][29][30][31][32][33][34], and electrodeposition from aqueous solutions [13,[21][22]25,35], have been investigated. Compared with polycrystalline counterparts, cobalt oxide nanocrystals are found to be characterized with superior physical and chemical properties [36].…”
Section: Introductionmentioning
confidence: 99%
“…Several deposition methods have been used in preparing cobalt monoxide thin films among which are sol-gel dip-coating technique [11], chemical vapour deposition [12], electron beam evaporation [13], spray pyrolysis [14], sputtering [15], γ-irradiation [16], and sonication assisted methods [17].…”
Section: Introductionmentioning
confidence: 99%