2020
DOI: 10.1007/s11664-020-07950-0
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Separate Absorption and Multiplication AlGaN Solar-Blind Avalanche Photodiodes With High-low-Doped and Heterostructured Charge Layer

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Cited by 5 publications
(4 citation statements)
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“…Therefore, by adding a charge layer to separate the absorption and multiplication layers is an effective way to enhance the gain and reduce noise. Figure 10A shows the schematic of a backside illuminated SAM APD structure (McClintock et al, 2009;Zheng et al, 2012;Wang et al, 2014;Shao et al, 2017;Ji et al, 2018;Zhang et al, 2020), and the corresponding electric field distribution along the depletion region. By inserting a Si-doped charge layer to separate the absorption and multiplication layers, the electric field in the absorption layer remains low that avalanche multiplication cannot be triggered in the absorption layer, while the electric field in the multiplication layer remains high where the avalanche can occur.…”
Section: A Survey Of Gan-based Avalanche Photodiode Structuresmentioning
confidence: 99%
“…Therefore, by adding a charge layer to separate the absorption and multiplication layers is an effective way to enhance the gain and reduce noise. Figure 10A shows the schematic of a backside illuminated SAM APD structure (McClintock et al, 2009;Zheng et al, 2012;Wang et al, 2014;Shao et al, 2017;Ji et al, 2018;Zhang et al, 2020), and the corresponding electric field distribution along the depletion region. By inserting a Si-doped charge layer to separate the absorption and multiplication layers, the electric field in the absorption layer remains low that avalanche multiplication cannot be triggered in the absorption layer, while the electric field in the multiplication layer remains high where the avalanche can occur.…”
Section: A Survey Of Gan-based Avalanche Photodiode Structuresmentioning
confidence: 99%
“… 8 This makes AlGaN and their based heterostructures very promising for the realization of a number of electronic and optoelectronic devices, such as high electron mobility transistors (HEMT), 9 11 metal–oxide semiconductor (MOS) HEMT, 12 MOS heterostructures field-effect transistor, 13 , 14 ultra-violate (UV) light-emitting diodes (LEDs), 15 18 and solar-blind UV photodetectors 19 21 …”
Section: Introductionmentioning
confidence: 99%
“…[5][6][7][8] This makes AlGaN and their based heterostructures very promising for the realization of a number of electronic and optoelectronic devices, such as high electron mobility transistors (HEMT), [9][10][11] metal-oxide semiconductor (MOS) HEMT, 12 MOS heterostructures field-effect transistor, 13,14 ultra-violate (UV) light-emitting diodes (LEDs), [15][16][17][18] and solar-blind UV photodetectors. [19][20][21] Yet, the performance of AlGaN-based devices has been limited by some challenging issues connected to the AlGaN layer quality, 4,8,22 e.g., the relatively low internal quantum efficiency, the poor p-type doping efficiency, and hardly achievable n-and p-type good ohmic contacts. 8,23 The primary factor responsible for the issues mentioned above is the presence of high dislocation and point-defect densities in the AlGaN epilayer due to heteroepitaxy on foreign substrates.…”
Section: Introductionmentioning
confidence: 99%
“…Deep-ultraviolet photodetectors (DUV-PDs) are extensively used in military and civil fields for missile guidance, optical imaging, optical space communication, optical imagery, optical spatial communication and navigational positioning, among other things [1][2][3][4][5][6][7][8][9][10]. In particular, solar-blind PDs are fabricated on wide-bandgap materials such as ZnMgO [11][12][13], AlGaN [14][15][16], BeZnO [17,18], Zn 2 GeO 4 [19,20], ZnGa 2 O 4 [21][22][23], LaAlO 3 [24,25], In 2 Ge 2 O 7 [26], BN [27,28] and diamond [29,30]. However, these materials require an alloying process to achieve the desired wide bandgap for solar-blind PD applications.…”
Section: Introductionmentioning
confidence: 99%