Sheath dynamics in plasma immersion ion implantation

Brutscher, J.; Günzel, R.; Möller, W.

doi:10.1088/0963-0252/5/1/007

Cited by 41 publications

(19 citation statements)

References 22 publications

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“…The sheath dynamics, which has already been extensively studied for different geometries, planar, cylindrical, or spherical, in the case of non-collisional sheaths [4,7,11,[39][40][41] and collisional sheaths [42], is now well understood.…”

Section: B Plasma Sheath Dynamicsmentioning

confidence: 99%

Plasma-based ion implantation and deposition: a review of physics, technology, and applications

Pelletier

Anders

2005

IEEE Trans. Plasma Sci.

174

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After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based ion implantation and deposition (PBIID) can now be considered mature technologies for surface modification and thin film deposition. This review starts by looking at the historical development and recalling the basic ideas of PBII. Advantages and disadvantages are compared to conventional ion beam implantation and physical vapor deposition for PBII and PBIID, respectively, followed by a summary of the physics of sheath dynamics, plasma and pulse specifications, plasma diagnostics, and process modelling. The review moves on to technology considerations for plasma sources and process reactors. PBII surface modification and PBIID coatings are applied in a wide range of situations. They include the by-now traditional tribological applications of reducing wear and corrosion through the formation of hard, tough, smooth, low-friction and chemically inert phases and coatings, e.g. for engine components. PBII has become viable for the formation of shallow junctions and other applications in microelectronics. More recently, the rapidly growing field of biomaterial synthesis makes used 1 of PBII&D to produce surgical implants, bio-and blood-compatible surfaces and coatings, etc.With limitations, also non-conducting materials such as plastic sheets can be treated. The major interest in PBII processing originates from its flexibility in ion energy (from a few eV up to about 100 keV), and the capability to efficiently treat, or deposit on, large areas, and (within limits) to process non-flat, three-dimensional workpieces, including forming and modifying metastable phases and nanostructures.We use the acronym PBII&D when referring to both implantation and deposition, while PBIID implies that deposition is part of the process.2

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Section: B Plasma Sheath Dynamicsmentioning

confidence: 99%

Plasma-based ion implantation and deposition: a review of physics, technology, and applications

Pelletier

Anders

2005

IEEE Trans. Plasma Sci.

174

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“…where n i is the ion density, e the elementary charge, u i the ion velocity, and S the surface area of the target. Assuming that the ion flow is collisionless because the mean free path for carbon particles is roughly calculated to be 1.0 m at 10 À2 Pa gas pressure, the ion velocity u i around the boundary between the sheath and the plasma can be expressed using a Bohm criterion, 33,34)…”

Section: Resultsmentioning

confidence: 99%

Production of Titanium-Containing Carbon Plasma Using Shunting Arc Discharge for Hybrid Film Deposition

Takaki¹,

Murakami²,

Mukaigawa³

et al. 2010

Jpn. J. Appl. Phys.

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A carbon-shunting arc discharge was generated with a titanium cathode for titanium-containing carbon plasma production to deposit carbon-based hybrid films. A carbon rod of 2 mm diameter and 40 mm length was employed for generation of the carbon shunting arc discharge. A silicon substrate was immersed into the plasma, and a series of negative pulse voltages were applied to the substrate holder synchronized with shunting arc discharge ignition. The cathode side rod holder material was changed from carbon to titanium to supply holder material particles into the carbon shunting arc plasma. The shunting arc plasma was successfully produced for both rod holder materials. Heating energy to generate the shunting arc was reduced using titanium as the cathode side holder material. A spectroscopic measurement from plasma light emission showed that the produced plasma contained titanium ions at employing titanium as the cathode material. The ions contained in the produced plasma were extracted with -2.0 kV negative pulse voltage. The ion current at the titanium cathode was larger value than that of the carbon cathode. X-ray photoelectron spectroscopy showed that the prepared carbon films contained titanium and showed a Ti/C ratio of 0.099 at 1200 V charging voltage of a 200 µF capacitor.

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“…Surface morphology influences wettability, and is therefore also investigated in this work. A suitable technology for ion implantation of polymers is plasma immersion ion implantation (PIII), which is also applied to many other materials 2,3 . This technology offers the possibility to independently change the current density during the pulsed ion implantation process as well as the average dose of the incident ions.…”

Section: Introductionmentioning

confidence: 99%

Surface modification of white PVC polymer by different plasma immersion techniques

SantAna¹,

Bortoleto²,

Cruz³

et al. 2020

RBAV

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Polymer substrates have several distinct advantages, such as, robustness, low density, impact resistance, and conformity over glass substrates for optical applications. Some applications are impeded, however, owing to its low adhesion to thin films, surface roughness, and low gas permeability. In this work, the wettability and the surface morphology of Poly(Vinyl) Chloride, PVC, samples were modified by plasma immersion. PVC was chosen because of its already wide use and low cost: PVC is used in floor coverings, plumbing, electrical insulation, hoses, containers, and other accessories. In this work, plasma immersion was used to modify the chemical structure of white PVC, producing high values of contact angles (θ > 100º) in fluorine plasmas, measured immediately after treatments, and until 30 days after. Also, it was detected low values of contact angles (θ < 50º) in nitrogen plasmas. Atomic Force Microscopy revealed smooth surfaces, whose roughness, R z , was less than ~13 nm, except for plasma immersion cathode, which yielded a R z of ~213 nm.

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Sheath dynamics in plasma immersion ion implantation

Cited by 41 publications

References 22 publications

Plasma-based ion implantation and deposition: a review of physics, technology, and applications

Plasma-based ion implantation and deposition: a review of physics, technology, and applications

Production of Titanium-Containing Carbon Plasma Using Shunting Arc Discharge for Hybrid Film Deposition

Surface modification of white PVC polymer by different plasma immersion techniques

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