2015 10th International Workshop on the Electromagnetic Compatibility of Integrated Circuits (EMC Compo) 2015
DOI: 10.1109/emccompo.2015.7358366
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Shielding structures for through silicon via (TSV) to active circuit noise coupling in 3D IC

Abstract: Through silicon via (TSV) has been extensively highlighted as the key solution for small form factor wide bandwidth, and low power consumption with compactly integrating multiple chips. Despite the many advantages of TSV based 3-dimensional integrated circuit (3D IC), there are several challenges to be overcome such as noise coupling, fabrication process limits, and failure issues. In this paper, we proposed shielding structures for TSV to active circuit noise coupling in 3D IC. The proposed structures can cap… Show more

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Cited by 6 publications
(2 citation statements)
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“…Common methods for integrating three dimensions include wafer-on-wafer (W-o-W), chip-on-chip (C-o-C), and chip-on-wafer (C-o-W) stacking. One common technique for vertical device integration in the semiconductor industry is Cu-Cu-WoW bonding [3]- [10]. Modern hardware [11]- [16] integrated in three dimensions may enhance system performance.…”
Section: Introductionmentioning
confidence: 99%
“…Common methods for integrating three dimensions include wafer-on-wafer (W-o-W), chip-on-chip (C-o-C), and chip-on-wafer (C-o-W) stacking. One common technique for vertical device integration in the semiconductor industry is Cu-Cu-WoW bonding [3]- [10]. Modern hardware [11]- [16] integrated in three dimensions may enhance system performance.…”
Section: Introductionmentioning
confidence: 99%
“…For instance; limited reliability, thermal cycling, electro migration, silicon depletion at or around the via and also shock and vibration. Noise coupling, fabrication process limits and failure issues have been discussed in [10]. However TSV has several advantages such as reducing the delay, power and area.…”
Section: Through Silicon Via (Tsv) Technologymentioning
confidence: 99%