Si containing block copolymers quickly assemble into sub-6 nm domains

Abstract

Directed self-assembly (DSA) of block copolymer (BCP) is a potential patterning technology for sub-7 nm lithography. Series of styryl-polyhedral oligomeric silsesquioxanes(POSS)-containing BCPs, poly(N-propyl-4-vinylbenzamide isobutyl POSS)-block-poly(heptafluorobutyl methacrylate) (PStNPOSS-b-PHFBMA) and poly(styrene-co-N-propyl-4-vinylbenzamide isobutyl...