introduced some new problems, such as limited application scenarios or reduced time resolution. As an important component of imaging systems, improving the performance of photodetectors (PDs) becomes a more effective way to overcome the above issues. [6-8] The weak-light detectable limit (WDL) and linear dynamic range (LDR) are two critical parameters for PDs to determine the image quality under weak-light conditions. As a main stream for image sensors, the silicon-based PDs have been widely used in digital cameras and smartphones. These PDs possess low-noise, broadband and high-detectivity properties. However, silicon has a narrow band gap of 1.1 eV leading to unwanted near-infrared response, [9] which increases the optical noise and reduces image quality. Though other semiconductors like NiO and ZnO with wider band gaps exhibit equally specific detectivity, [10,11] the WDL and LDR are less than satisfactory, along with large dark current density. Therefore, it is highly desirable to find novel high-performance PDs with low WDL and broad LDR, as well as low-cost manufacturing procedure and assembling techniques. Recently, methylammonium metal halide perovskites have been intensively studied in the field of photodetection due to their extraordinary optoelectronic properties. [12-14] The main obstacle for the high-performance device fabrication is the instability issue. [15,16] Fortunately, inorganic metal halide perovskites, CsPbX 3 (X = Cl, Br, I) exhibiting both high stability and tunable band gap, are considered to be one kind of promising materials to address the instability issues. [17] Recently, perovskites have been widely applied in the field of photoelectric imaging. [18-20] Although great improvements have been made in previous imaging applications, the image contrast and SNR of as reported inorganic perovskite PDs-based imaging are still not satisfactory, and less attention has been paid to weak-light imaging applications. Extensive attempts have been made to improve the photodetection performance of PDs. An effective strategy is introducing interfacial passivation layers by atomic layer deposition (ALD) technique. [21-24] ALD can synthesize thickness-controlled, dense, and uniform thin films at low temperature, [25] which meets the critical demands for the heterojunctions fabrication. Rehman et al. reported that J sc of Graphene/Si solar cell rises from 27.8 to 33.4 mA cm −2