2019
DOI: 10.1021/acsami.8b20751
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Silicene Passivation by Few-Layer Graphene

Abstract: The stabilization of silicene at ambient conditions is essential for its characterization, future processing and device integration. Here, we demonstrate in-situ encapsulation of silicene on Ag(111) by exfoliated few-layer graphene (FLG) flakes, allowing subsequent Raman analysis under ambient conditions. Raman spectroscopy measurements proved that FLG capping serves as an effective passivation, preventing degradation of silicene for up to 48 hours.The acquired data are consistent with former in-situ Raman mea… Show more

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Cited by 21 publications
(28 citation statements)
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“… 34 In our previous work, we have presented a method for passivating silicene layers by encapsulating them by few-layer graphene (FLG) flakes. 19 The passivation, performed directly in UHV, is based on the mechanical exfoliation of graphite on top of the freshly grown silicene layer. The FLG flake forms an exceptional barrier against oxidative species and, thanks to its inert surface, preserves silicene structure unaltered.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“… 34 In our previous work, we have presented a method for passivating silicene layers by encapsulating them by few-layer graphene (FLG) flakes. 19 The passivation, performed directly in UHV, is based on the mechanical exfoliation of graphite on top of the freshly grown silicene layer. The FLG flake forms an exceptional barrier against oxidative species and, thanks to its inert surface, preserves silicene structure unaltered.…”
Section: Resultsmentioning
confidence: 99%
“…To enable detailed polarized micro-Raman characterization, silicene was passivated in situ immediately after the growth by mechanical exfoliation of few-layer hBN or graphene flakes (HQ Graphene) 19 in a dedicated UHV chamber, directly connected to the evaporation chamber.…”
Section: Methodsmentioning
confidence: 99%
“…27−29 For graphene, we demonstrated recently that it is capable of forming an effective barrier against oxidizing species, while preserving the structural integrity of a subjacent silicene layer on Ag(111). 29 In this study, silicene was passivated in situ directly after the growth using few-layer hBN, which has already been proven to be a suitable passivation for silicene 30 and germanene. 31 The intrinsic transparency of hBN with a wide band gap of 5.95 eV 32 enables direct access to the optical properties of the subjacent silicene layer over a wide spectral range.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…Similar observations have been made when passivating silicene on Ag(111) with fewlayer graphene using the same technique. 29 Notably, traces of intact silicene in the center of an hBN flake can even be detected after several days in ambient atmosphere.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…[ 195 ] Encapsulation of the silicene layer with ultra‐thin Al layer [ 196 ] and Al 2 O 3 [ 197 ] is an effective action to prevent the degradation process. As the excellent passivation layers, the 2D materials such as graphene [ 198 ] must be air‐stable and with inertness and good flexibility. Surface fluorinated silicene can provide more stability and thus induce transition from semiconductor to metal.…”
Section: Selected Properties Of Xenes For Electrochemical Applicationmentioning
confidence: 99%