Silicon anisotropic etching in Triton‐mixed and isopropyl alcohol‐mixed tetramethyl ammonium hydroxide solution

Yao, Mingqiu; Tang, Bin; Sato, Kazuo; Su, Wei

doi:10.1049/mnl.2015.0104

Cited by 6 publications

(2 citation statements)

References 18 publications

(15 reference statements)

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“…The first additive under consideration is an IPA, since it has already been proved effective to decrease the surface roughness of silicon in various reported works [12, 15]. Besides, the quartz contains some impurities, such as Co 2+ , Ba 2+ , Mg 2+ and Ag + .…”

Section: Introductionmentioning

confidence: 99%

Effects of isopropyl alcohol and acetic acid on surface roughness of Z‐cut quartz etched by ammonium bifluoride solution

Zhang

Tang

et al. 2017

Micro & Nano Letters

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Quartz has been widely used in modern microelectromechanical systems (MEMS) industry, and wet etching is one of the primary techniques used for its manufacturation. There are many reported literatures focused on the study of etched profiles or etching rate of quartz, but few on its surface quality. Inspired by the surface quality improved by using additives in the silicon wet etching process, the effects of isopropyl alcohol (IPA) and acetic acid on the surface roughness of Z-cut quartz etched by ammonium bifluoride (NH 4 HF 2) solution were investigated for the first time. Different concentration of IPA or/and acetic acid was added into the NH 4 HF 2 solution, and the morphology of the etched surface was observed using scanning electron microscope and measured by a surface profilometer. It was found that the surface roughness of the Z-cut quartz decreased with the increasing of IPA or acetic acid concentration. Moreover, the etched surface roughness could be further decreased by using the ternary solution containing IPA and acetic acid. The best etched result (R a = 0.12 μm) was obtained when the solution is composed of saturated NH 4 HF 2 + 15% v/v IPA + 10% v/v acetic acid. This work provides a new method to improve the surface quality of Z-cut quartz, and it will benefit the future design and manufacturation work of quartz MEMS devices.

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Section: Introductionmentioning

confidence: 99%

Effects of isopropyl alcohol and acetic acid on surface roughness of Z‐cut quartz etched by ammonium bifluoride solution

Zhang

Tang

et al. 2017

Micro & Nano Letters

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“…Inspired by these results, the effect of adding additive on surface roughness in quartz wet etching should be investigated. IPA has been proven to effectively decrease the surface roughness of silicon [ 22 , 26 ]. So, the effects of IPA additives on the etched surface roughness of quartz was investigated in this paper.…”

Section: Introductionmentioning

confidence: 99%

Surface Roughness of Z-Cut Quartz Etched by Ammonium Bifluoride and Ammonium Bifluoride Mixed with Isopropyl Alcohol Solutions

Zhang

Tang

et al. 2017

Micromachines

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It is meaningful to study the surface morphology of monocrystalline material, but there are few studies on the surface roughness of quartz. So, surface roughness of Z-cut quartz etched by pure ammonium bifluoride and ammonium bifluoride mixed with isopropyl alcohol (IPA) solution was investigated for the first time in this paper. Firstly, when etching in pure ammonium bifluoride solutions, the surface roughness change with etching time, etching temperature, and solution concentration were studied. Then, the surface roughness improvement given by isopropyl alcohol solution was analyzed carefully. The experimental results indicated that: the surface roughness of Z-cut quartz (0001) plane increased with etching time, but decreased with etching temperature and solution concentration; the adding of isopropyl alcohol in ammonium bifluoride solution could decrease the roughness and improve the surface quality. This is the first systemic research of the evolution of quartz surface roughness when etching in ammonium bifluoride solution, and will benefit the future design and manufacture of quartz MEMS devices.

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Silicon Etching Characteristics in Modified TMAH Solution

Swarnalatha

Rao

Pal

2019

Springer Proceedings in Physics

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Silicon anisotropic etching in Triton‐mixed and isopropyl alcohol‐mixed tetramethyl ammonium hydroxide solution

Cited by 6 publications

References 18 publications

Effects of isopropyl alcohol and acetic acid on surface roughness of Z‐cut quartz etched by ammonium bifluoride solution

Effects of isopropyl alcohol and acetic acid on surface roughness of Z‐cut quartz etched by ammonium bifluoride solution

Surface Roughness of Z-Cut Quartz Etched by Ammonium Bifluoride and Ammonium Bifluoride Mixed with Isopropyl Alcohol Solutions

Silicon Etching Characteristics in Modified TMAH Solution

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