2014
DOI: 10.1098/rsta.2013.0113
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Silicon-based silicon–germanium–tin heterostructure photonics

Abstract: The wavelength range that extends from 1550 to 5000 nm is a new regime of operation for Si-based photonic and opto-electronic integrated circuits. To actualize the new chips, heterostructure active devices employing the ternary SiGeSn alloy are proposed in this paper. Foundry-based monolithic integration is described. Opportunities and challenges abound in creating laser diodes, optical amplifiers, light-emitting diodes, photodetectors, modulators, switches and a host of high-performance passive infrared waveg… Show more

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Cited by 57 publications
(28 citation statements)
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“…Typically, directness is found for a tin fraction above 9%. This materials system is the foundation of a silicon-based SiGeSn heterostructure technology in which a complete suite of integrated optical components, both active and passive, can in principle be built on silicon using these group IV alloys [46]. Single mode SiGeSn channel waveguide designs are now available for the midwave/ longwave infrared [47], and the range of transparency (high transmission) can be 2 to 20 m, for example, with the starting wavelength dependent upon bandgap ð" h!…”
Section: Prospects For Fce In Sigesnmentioning
confidence: 99%
“…Typically, directness is found for a tin fraction above 9%. This materials system is the foundation of a silicon-based SiGeSn heterostructure technology in which a complete suite of integrated optical components, both active and passive, can in principle be built on silicon using these group IV alloys [46]. Single mode SiGeSn channel waveguide designs are now available for the midwave/ longwave infrared [47], and the range of transparency (high transmission) can be 2 to 20 m, for example, with the starting wavelength dependent upon bandgap ð" h!…”
Section: Prospects For Fce In Sigesnmentioning
confidence: 99%
“…A promising solution is to open new spectral regions at wavelengths near 2 μm and to exploit the long-wavelength transmission and amplification capabilities of hollowcore photonic-bandgap fibres 2,3 and the recently available thulium-doped fibre amplifiers 4 . To date, photodetector devices for this window have largely relied on III-V materials 5 or, where the benefits of integration with silicon photonics are sought, GeSn alloys, which have been demonstrated thus far with only limited utility [6][7][8][9] . Here, we describe a silicon photodiode operating at 20 Gbit s -1 in this wavelength region.…”
mentioning
confidence: 99%
“…The fact that the eye is still open is a promising result, although the relative closure compared to the 20 Gbit s -1 data indicates that the detector is operating Eye diagrams for a 1-mm-long detector operating at a wavelength of 1.96 μm. The timescale is 20 ps div −1 and the pseudo-random binary sequence length is 27 -1 for all images. a, 20 Gbit s −1 at 27 V reverse bias.…”
mentioning
confidence: 99%
“…These materials are the material focus of of "group IV photonics" which is a practical siliconbased technology for high-volume photonic-circuit manufacture in a CMOS opto-electronic foundry. Along with Ge, the "Ge-rich" materials SiGe and GeSn are the most important semiconductors for migrating the near-infrared (NIR, i. e. 1.31-1.55 µm) group IV photonics into the mid-infrared (MIR) region [3][4][5], initially at wavelengths of 1.8 to 5.0 µm and eventually towards 14 µm. The migration has begun and momentum in this research area is building rapidly.…”
Section: Introductionmentioning
confidence: 99%
“…The migration has begun and momentum in this research area is building rapidly. Group IV photonics at MIR-as in the 1.3/1.6 µm telecommunications bands-has wide-ranging sensing and communications applications [3][4][5] and is CMOS-compatible.…”
Section: Introductionmentioning
confidence: 99%