2001
DOI: 10.1088/0960-1317/11/4/305
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Silicon microphone based on surface and bulk micromachining

Abstract: In this paper a silicon microphone which can be fabricated using standard semiconductor processes is presented. The acoustic-electrical transducer is based on the capacitance change of a movable 400 nm thin poly-silicon membrane with different diameters (800-1200 µm). A source follower was integrated to transform the impedance. The complete chip is 2 × 2 × 0.5 mm 3 in size. The sensitivity achieved is in the range of 0.4 to 3.2 mV Pa −1 .

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Cited by 19 publications
(18 citation statements)
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“…The main advantages of the capacitive silicon sensors are their high sensitivity to pressure and low sensitivity to temperature. Furthermore, the junction field effect transistor with high input impedance must be selected as a detection circuit [2,9]. Figure 2 shows the fabrication process for the air-gap structure MEMS acoustic sensor.…”
Section: The Detection Principlementioning
confidence: 99%
See 2 more Smart Citations
“…The main advantages of the capacitive silicon sensors are their high sensitivity to pressure and low sensitivity to temperature. Furthermore, the junction field effect transistor with high input impedance must be selected as a detection circuit [2,9]. Figure 2 shows the fabrication process for the air-gap structure MEMS acoustic sensor.…”
Section: The Detection Principlementioning
confidence: 99%
“…The present standard electret condenser microphone (ECM) cannot undergo SMD mounting, because it would be destroyed by the high temperature of the soldering process involved [2]. Researchers now anticipate that the silicon-based condenser MEMS acoustic sensor, which is based on semiconductor technology, will be able to overcome the problem.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Research and development of MEMS microphones has been ongoing for some 20 years in order to manufacture a product suitable for customer applications. Requirements such as operation at standard supply voltages [11], support of surface mount packaging [12], use of standard CMOS processes during manufacture [13], and acceptable signal to noise ratio [14] have recently been realised and have led to a breakthrough in MEMS microphone production and usage today. Recent advances in MEMS microphone technology have resulted in the integration of the ADC on the same chip as the microphone and amplifier, producing a digital microphone in which the output of the chip is a Pulse Density Modulated (PDM) version of the incident acoustic signal.…”
Section: Introductionmentioning
confidence: 99%
“…Various single chip and double chip processes have been reported to enhance microphone frequency response [18][19][20][21][22]. In single chip processes, thick epitaxial growth or siliconon-insulator is required to fabricate rigid backplate, but which increases process complexity.…”
Section: Design Considerationsmentioning
confidence: 99%