2004
DOI: 10.1016/j.sse.2004.03.016
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Silicon nanocrystal memory devices obtained by ultra-low-energy ion-beam synthesis

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Cited by 69 publications
(35 citation statements)
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“…The formation of dispersed second phase nanoparticle ͑NP͒ systems in silica films via ion beam synthesis have been extensively studied in connection with technical applications exploring luminescent [1][2][3] or electrostatic [4][5][6] ͑Cou-lomb blockade͒ properties for the development of silicon based devices. The primary concept behind the ion beam synthesis method relies on the formation of a supersaturated solid solution produced by the implantation process, followed by the nucleation and growth of the new phase upon post-implantation thermal treatments.…”
Section: Introductionmentioning
confidence: 99%
“…The formation of dispersed second phase nanoparticle ͑NP͒ systems in silica films via ion beam synthesis have been extensively studied in connection with technical applications exploring luminescent [1][2][3] or electrostatic [4][5][6] ͑Cou-lomb blockade͒ properties for the development of silicon based devices. The primary concept behind the ion beam synthesis method relies on the formation of a supersaturated solid solution produced by the implantation process, followed by the nucleation and growth of the new phase upon post-implantation thermal treatments.…”
Section: Introductionmentioning
confidence: 99%
“…Nonvolatile memory devices are expected to be operated at a lower voltage and with higher integration than conventional floating-gate memories [3]. Nonvolatile memory devices made of silicon nanocrystal (nc-Si) and germanium nanocrystal (nc-Ge) embedded in/on an oxide layer have been fabricated by several techniques such as chemical vapor deposition (CVD) [4,5], using a molecular ion beam [6,7] and, recently, using a focused ion beam (FIB) [8]. The FIB was used because they enable the formation of nanocrystal dots by a focused gallium (Ga + ) ions that can be precisely irradiated at array positions of nanoscale order.…”
Section: Introductionmentioning
confidence: 99%
“…8 Such conditions restore significantly the integrity of the oxide and lead to gate stacks suitable for nonvolatile memory devices operating at low voltages. 9 Annealing in oxidizing conditions affects also the NC population. 10 As a consequence the oxidation step can be used for monitoring the size, density, and surface fraction of the NC population and thus for controlling the memory performance of the final devices.…”
Section: Introductionmentioning
confidence: 99%