Si quantum dots or interchangeably Si nanocrystals are promising materials for all-Si tandem solar cells in next generation photovoltaics. Si QDs in this study were fabricated by annealing sputtered Si rich oxide/SiO 2 (SRO/SiO 2 ) bilayer superlattice thin-films. Advantages of high Si content SRO layers include lower resistivity and higher light absorption crosssections which are more suitable for photovoltaic devices.
However, theoretically high Si content SRO produces greater size distribution and larger Si nanocrystals which in this case slightly lowers the bandgap towards that of crystalline Si. This study investigates the properties of high Si content SRO/SiO 2 bilayer superlattice thin-films and the effect of boron and phosphorus doping.Index Terms -Boron, Doping, Phosphorus, Magnetron Sputtering, Si Quantum Dots, Si Nanocrystals. 978-1-4799-7944-8/15/$31.00 ©2015 IEEE 978-1-4799-7944-8/15/$31.00 ©2015 IEEE