2014
DOI: 10.1016/j.solmat.2014.06.007
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Silicon nanocrystal photovoltaic device fabricated via photolithography and its current–voltage temperature dependence

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Cited by 15 publications
(2 citation statements)
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“…Current crowding and high series resistance were encountered for p-i-n Si QD solar cell devices with an open-circuit voltage of 493 V, fabricated by Perez-Wurfl et al [12], [13]. Recent efforts in Si QD solar cell devices have focused on higher Si content SRO to avoid current crowding and to decrease series resistance [14]. However, higher Si content SRO theoretically compromises the quantum confinement (i.e.…”
Section: Introductionmentioning
confidence: 99%
“…Current crowding and high series resistance were encountered for p-i-n Si QD solar cell devices with an open-circuit voltage of 493 V, fabricated by Perez-Wurfl et al [12], [13]. Recent efforts in Si QD solar cell devices have focused on higher Si content SRO to avoid current crowding and to decrease series resistance [14]. However, higher Si content SRO theoretically compromises the quantum confinement (i.e.…”
Section: Introductionmentioning
confidence: 99%
“…The details of sample preparation are presented in our previous work. 15 A 2-in. B target was used to deposit the dopant.…”
mentioning
confidence: 99%