Silicon Nanopillars Formed by Reactive Ion Etching Using a
Self-Organized Gold Mask

Ovchinnikov, Victor; Malinin, A. A.; Новиков, С. В.; Tuovinen, C.

doi:10.1238/physica.topical.079a00263

Cited by 8 publications

(4 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The mask was prepared by sequential deposition of thin gold and chromium films on the (100) p-type silicon substrate, followed by an annealing step [4] . The gold and chromium layers were formed by e-beam evaporation under high vacuum (106 Torr) at room temperature, at a rate of 0.…”

Section: Methodsmentioning

confidence: 99%

See 1 more Smart Citation

Nanostructure fabrication process for optoelectronic applications

Malinin¹,

Ovchinnikov²,

Toivola³

et al. 2000

SPIE Proceedings

View full text Add to dashboard Cite

Silicon nanostructures present a new class of material systems that possess electrical and optical properties different from bulk and conventional thin film structures.We present a fabrication process for devices based on silicon nanopillars. The pillars were obtained by means of selforganized gold-chromium and polystyrene sphere masks and reactive ion etching of silicon. The evolution of pillar shape during reactive ion etching (RIE) was observed by scanning electron microscopy (SEM) and explained by combined effect of backscattering and polymerization. On this base the optimal modes for the RIE were found. Mask properties that influence on pillar size distribution (30-100 nm) and density can be simply changed by means of metal layers thickness or polystyrene sphere diameter. The presented fabrication process allows the production of silicon nanopillars with different shapes and heights (up to 600 nm) on 4" wafer. Properties of silicon nanostructures were investigated by photoluminescence (PL) and cathodoluminescence (CL) techniques. Electroluminescent devices, based on silicon nanostructures, were made after planarization and top electrode formation. Stable strong electroluminescence in visible and near JR range was observed.

show abstract

Section: Methodsmentioning

confidence: 99%

“…In our previously reported demonstration [4], a network of gold islands was prepared by heat treatment of a 1 .0 nm thick evaporated gold film in ultra high vacuum conditions. The areal density of the gold islands was not large enough and there is a big variation in the diameter of the islands.…”

Section: Introductionmentioning

confidence: 99%

Nanostructure fabrication process for optoelectronic applications

Malinin¹,

Ovchinnikov²,

Toivola³

et al. 2000

SPIE Proceedings

View full text Add to dashboard Cite

show abstract

“…Methods using self-organization or -assembly are classified as 'bottomup' processes or hybrids of 'top-down' and 'bottom-up'. For instance, self-masking methods are used for nano-pillars in silicon [14,15].…”

Section: Self-organization In Nanotechnology/top Down Versus Bottom Upmentioning

confidence: 99%

Fused silica ‘glass grass’: fabrication and utilization

Lilienthal

Stubenrauch

Fischer

et al. 2010

J. Micromech. Microeng.

View full text Add to dashboard Cite

Modifications of surface morphology significantly improve integration possibilities and properties of materials in NEMS, MEMS and μTAS, especially of fused silica. Self-organized nanostructures in fused silica, termed 'glass grass', produced by plasma dry etching methods are investigated. These structures appear as 'grass', 'needles', 'pillars' or even 'tubes' depending on etching conditions. A comprehensive study of surface morphology modification parameters, regarding reactive ion etching (RIE) and deep reactive ion etching (DRIE) (inductive coupled plasma (ICP)), is presented. The nanostructures are described and characterized by shape, geometry and density with scanning electron microscopy and energy dispersive x-ray. The influences of coil/platen power, flow rates, etch gases, pressure and etch time on the geometry are derived. Application experiments, such as bonding technologies, which support integration into hybrid material systems, and cell adhesion investigations, are carried out.

show abstract

“…In particular, the number of material surfaces that offer a tuneable parameter range is insufficient. In spite of the huge progress in material science, chemical and topographical surface gradients have mainly been investigated separately [ 13 ] neglecting composite materials such as semiconductor/metal structures [ 14 – 17 ]. Only a few attempts to study cell–surface interactions through topographical and chemical gradients have been reported to date [ 18 ].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of multi-parametric platforms based on nanocone arrays for determination of cellular response

Purwaningsih¹,

Schoen²,

Wolfram³

et al. 2011

Beilstein J. Nanotechnol.

View full text Add to dashboard Cite

SummaryCellular response to both surface topography and surface chemistry has been studied for several years. However, most of the studies focus on only one of the two parameters and do not consider their possible synergistic effects. Here, we report on a fabrication method for nanostructured surfaces composed of highly ordered arrays of silica nanocones with gold tips. By using a combination of block copolymer nanolithography, electroless deposition, and reactive ion etching several parameters such as structure height and structure distance could easily be adjusted to the desired values. The gold tips allow for easy functionalization of the substrates through a thiol linker system. Improved neural cell adhesion can be obtained and is dependent on the nature of the nanocone surface, thus illustrating the influence of different surface topographies on the nanometer length scale, on a complex cellular behavior such as cell adhesion. Substrate and surface functionality are shown to last over several days, leading to the conclusion that the features of our substrates can also be used for longer term experiments. Finally, initial neural cell adhesion is found to be more prominent on substrates with short intercone distances, which is an important finding for research dealing with the reactions of neuron-like tissue in the immediate moments after direct contact with an implanted surface.

show abstract

Silicon Nanopillars Formed by Reactive Ion Etching Using a Self-Organized Gold Mask

Cited by 8 publications

References 0 publications

Nanostructure fabrication process for optoelectronic applications

Nanostructure fabrication process for optoelectronic applications

Fused silica ‘glass grass’: fabrication and utilization

Fabrication of multi-parametric platforms based on nanocone arrays for determination of cellular response

Contact Info

Product

Resources

About