2008
DOI: 10.1109/memsys.2008.4443758
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Silicon nanowire coupled micro-resonators

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Cited by 16 publications
(13 citation statements)
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“…Based on standard IC-compatible processes, the fabrication technology is shown to deliver Si NW electromechanical resonators within a thick substrate with a two-order-of-magnitude scale difference between the Si NW and the surrounding architecture. Operation frequencies demonstrated are in the order of those reported in thin SOI [11][12][13], trench etching [14,19,25] and bottom-up [8,30] studies. The obtained Q for embedded Si NW resonator in thick SOI is also found to be comparable to those of several top-down reports [25,31,32].…”
Section: Resultsmentioning
confidence: 59%
See 1 more Smart Citation
“…Based on standard IC-compatible processes, the fabrication technology is shown to deliver Si NW electromechanical resonators within a thick substrate with a two-order-of-magnitude scale difference between the Si NW and the surrounding architecture. Operation frequencies demonstrated are in the order of those reported in thin SOI [11][12][13], trench etching [14,19,25] and bottom-up [8,30] studies. The obtained Q for embedded Si NW resonator in thick SOI is also found to be comparable to those of several top-down reports [25,31,32].…”
Section: Resultsmentioning
confidence: 59%
“…Alternatively, Si NW resonators on CMOS platforms are obtained by the top-down approach [11,12] offering lowpower consumption and scalable transduction [13]. Top-down technologies are mainly available for thin microelectronic substrates, where the out-of-plane dimensions of the Si NW resonator and the surrounding architecture are the same [14][15][16]. For the cases where the Si NW has to be attached to a much thicker MEMS device, a similar approach is adopted, where the nanoscale component is fabricated in thin silicon on insulator (SOI) first.…”
Section: Introductionmentioning
confidence: 99%
“…The fabricated bandpass filter presents very low passband distortion (less than 0.1 dB) without using any specific resistive termination, a central frequency of 26.7 MHz and a bandwidth of 120 kHz (with a bias voltage of 18 Vdc). The low passband distortion achieved is better than the state-of-the-art filters reported [1,2,4,5]. Unfortunately, the filter presents a very high insertion loss in the magnitude, which corresponds to the large motional resistance present in the CMOS-MEMS resonators compared with the input impedance of the test equipment.…”
mentioning
confidence: 88%
“…Many studies have focused on developing high-order filters for enhanced frequency response based on electrical or mechanical coupling of several MEMS resonators [2][3][4][5][6][7]. All of these examples use specific technologies for the fabrication of MEMS resonators.…”
mentioning
confidence: 99%
“…In any case, silicon nanowires remain sensitive piezoresistive gauges owing to their low cross section. Previous works combining MEMS with silicon nanowire used transferred nanowire [10] or top-down fabricated nanowire [11,12] directly attached to the moving structure. This limits both the motion detection range to the elongation limit of the nanowire and the stress resolution of in-situ measurements of nanowire stress gauge factors [10].…”
Section: Introductionmentioning
confidence: 99%