1992
DOI: 10.1016/0040-6090(92)90926-3
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Silver photodissolution in amorphous chalcogenide thin films

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Cited by 16 publications
(3 citation statements)
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“…Many different studies have been utilized to give information about how Ag ions diffuse into the chalcogenide (Ch) layer-from electrical resistivity measurement, 8,9 optical transmittance measurement, 10 modified optical reflectivity measurement, [11][12][13] X-ray diffraction measurement, 14,15 to Rutherford backscattering (RBS). [16][17][18][19][20][21][22] Among these techniques, electrical resistivity and X-ray diffraction are good tools to evaluate the Ag thickness, but it is difficult to obtain information on the chalcogenide layer and the reaction layer through them. The optical transmittance and reflection measurements are also good techniques to find the time-dependent change in the selected layer.…”
Section: Introductionmentioning
confidence: 99%
“…Many different studies have been utilized to give information about how Ag ions diffuse into the chalcogenide (Ch) layer-from electrical resistivity measurement, 8,9 optical transmittance measurement, 10 modified optical reflectivity measurement, [11][12][13] X-ray diffraction measurement, 14,15 to Rutherford backscattering (RBS). [16][17][18][19][20][21][22] Among these techniques, electrical resistivity and X-ray diffraction are good tools to evaluate the Ag thickness, but it is difficult to obtain information on the chalcogenide layer and the reaction layer through them. The optical transmittance and reflection measurements are also good techniques to find the time-dependent change in the selected layer.…”
Section: Introductionmentioning
confidence: 99%
“…GeSe 4=2 . As a consequence of their structure Ag þ ions diffuse into glassy GeSe upon irradiation with UV light, electrons, and ions [23]. AgGeSe glasses belong to the fast ion conducting solids group (superionic conductors) [10].…”
Section: Introductionmentioning
confidence: 99%
“…[14] However, current practices for patterning ChG films still requires electron-beam lithography (EBL) to dope Ag into ChG with low throughput and high cost, thus hindering the attempt to explore new ChG-based nanostructures and devices. [15] Imprint lithography has been developed to form large-scale nanostructures, where a stamp or template with pre-defined patterns is molded into a thermal-or light-sensitive imprint resists over a substrate; and after the patterns are transferred from the template into imprint resist, the template is removed. [16][17][18] Because of their relatively low glass transition temperature, bulk ChG glasses can be easily molded using a stamp at an elevated temperature.…”
Section: Introductionmentioning
confidence: 99%