Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology

He, Yuan; Byers, Erik; Light, Scott; Hines, Danielle; Devilliers, Anton; Hyatt, Mike; Zhou, Jianming; Nair, Vinay; Yu, Zhongchang; Cao, Yu; Xie, Xu; Shao, W.; Aldana, Rafael; Goossens, R.J.G.; Ma, Cui; Lu, Junwei; Liu, Huayu; Aquino, Christopher M.; Engblom, Peter; Nooitgedagt, Tjitte; Janda, Eric

doi:10.1117/12.848255

Cited by 5 publications

(2 citation statements)

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“…The second need is to realize the largest PW on every scanner. Using FlexRay and LithoTuner software, Pattern Matcher Full Chip (PMFC) [5,6], the PW can be maintained on every scanner by matching the scanners in a production environment. By matching a population of scanners, the total CDU of the fab improves which leads to better device yield.…”

Section: Introductionmentioning

confidence: 99%

Improved fab CDU with FlexRay and LithoTuner

Socha¹,

Shao²,

Xie³

et al. 2011

SPIE Proceedings

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FlexRay programmable illumination and LithoTuner software is combined in several use cases. The first use case is optical proximity error (OPE) minimization. Simulation predicts the rms OPE error is reduced by 39% with LithoTuner and FlexRay, and is confirmed via experiment with a reduction of 33%. For minimizing the OPE error, two types of illumination tuning was performed, sigma tuning and freeform tuning. The sigma tuning is able to reduce the mean-totarget critical dimension (CD) error, but the CD error variance is unaffected. Freeform tuning, however, is able to reduce both the mean-to-target CD and the CD error variance. The second use case is matching two ArF scanners, a XT:1950Hi with FlexRay to a XT:1700Fi with diffractive optical element (DOE) illumination. With LithoTuner and FlexRay, simulation predicts the CD error post-matching is reduced by 51%, and experiment was able to achieve a reduction of 29%.

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Section: Introductionmentioning

confidence: 99%

Improved fab CDU with FlexRay and LithoTuner

Socha¹,

Shao²,

Xie³

et al. 2011

SPIE Proceedings

Self Cite

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“…The first need is to create the largest overlapping process window (PW) possible. Using FlexRay 1) and source mask optimization (SMO) [2][3][4][5] software, the largest possible window is realized. FlexRay uses a programmable illuminator in which the source intensity is created with a micromirror array.…”

Section: Introductionmentioning

confidence: 99%

Using FlexRay in Computational Lithography

Socha¹,

Shao²,

Dommelen³

et al. 2011

Jpn. J. Appl. Phys.

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FlexRay programmable illumination and LithoTuner software is combined in several use cases. The first use case is source mask optimization (SMO) in which the process window is maximized for a static random access memory (SRAM) design. In a 55 nm half-pitch contact hole array (k 1 = 0.38, NA= 1.35, λ= 193 nm), the process window (PW) with FlexRay programmable illumination is twice as large as the PW with cQuad illumination defined through completely refractive illumination. The second use case is optical proximity error (OPE) minimization in which the large PW from SMO is realized on every scanner in the fab. The OPE error is reduced by 17% with LithoTuner and FlexRay. The third use case is matching two ArF scanners, a 1950i with FlexRay to a 1700i with diffractive optical element (DOE) illumination. With LithoTuner and FlexRay, the root means squared (rms) critical dimension (CD) error is reduced by 29% in this third use case. The last use case, intrafield dose optimization with DoseMapper is combined with FlexRay programmable source optimization to reduce the CD error on a wafer from a mean-to-target critical dimension (CD) error in the mask manufacturing process. This combination was optimized with LithoTuner to reduce the root mean square (rms) wafer CD error by 30%.

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A study on the automation of scanner matching

Serebryakov²,

Light

et al. 2013

SPIE Proceedings

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Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology

Cited by 5 publications

References 0 publications

Improved fab CDU with FlexRay and LithoTuner

Improved fab CDU with FlexRay and LithoTuner

Using FlexRay in Computational Lithography

A study on the automation of scanner matching

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